Standard Mold Sample Sales

When considering moving ahead NIL technology for a given project, the large cost of mask fabrication can become a hurdle too high. SCIVAX low cost standard specification molds with the objective of enable speedy initial NIL process tests.

And also, we have been continuously providing large full-scale pattern molds (4″~12″) which have many inquiries of our prospective. Not only standard molded samples (listed below) but also custom samples can be processed with our service. Please feel free to inquire for the details.

Silicon Mold

From an ultrafine pattern with the leading-edge semiconductor technology, until a pattern of the μm order such as Micro Lens Arrays, a wide variety of NIL molds can be fabricated.

High Aspect Ratio Pillar Mold (MLP230/500)
Available Size: φ4″~φ12″

Mold for High Luminance (MLP230/MLH230)
Available Size: φ4″~φ12″

Mold for High Luminance (MLP230/MLH230)
Cross section

List of Standard Mold

L & S

Commodity CodeDimension of Structure (Spec)Effective Area Stamp DimensionMaterialArray
MALS250/500/500-30×30 Width:250nm, Height:500nm, Pitch:500nm□30mm□40mmSilicon(Si)
NALS250/500/500-30X30Width:250nm, Height:500nm, Pitch:500nm □30mm□40mmNickel(Ni)
MTLS1/1/2-50×50Width:1μm, Height:1μm, Pitch:2μm□50mm□50mmSilicon(Si)
MTLS1/2/2-50×50Width:1μm, Height:2μm, Pitch:2μm□50mm□50mmSilicon(Si)
MALS5/1/10-30×30Width:5μm, Height:1μm, Pitch:10μm□30mm□40mmSilicon(Si)
NALS5/1/10-30×30Width:5μm, Height:1μm, Pitch:10μm□30mm□40mmNickel(Ni)
NALS500/250/1000-20×20Width:500nm, Height:250nm, Pitch:1000nm □20mm□30mmNickel(Ni)

Hole

Commodity CodeDimension of Structure Effective AreaStamp Dimension MaterialArray
MAH100/100/400-30X30φ100nm, Depth:100nm, Pitch:400nm□30mm□40mmSilicon(Si)Square
MAH250/500/500-30×30φ250nm, Depth:500nm, Pitch:500nm□30mm□40mmSilicon(Si)Hexagonal
MLH230/200/460-φ120φ230nm, Depth:200nm, Pitch:460nmφ120mmφ120mmSilicon(Si)Hexagonal
MAH300/300/600-30X30φ300nm, Depth:300nm, Pitch:600nm □20mm□25mmSilicon(Si)Hexagonal
MAH300/600/600-30X30φ300nm, Depth:600nm, Pitch:600nm□20mm□25mmSilicon(Si)Hexagonal
MAH300/600/800-30X30φ300nm, Depth:600nm, Pitch:800nm □20mm□25mmSilicon(Si)Square
MTH500/500/1000φ500nm, Depth:500nm, Pitch:1000nm□50mm□50mmSilicon(Si)Hexagonal
NAH2000/500/5000-30X30 φ2000nm, Depth:500nm, Pitch:5000nm □30mm□40mmNickel(Ni)Square
MTH1.9/2.3/3-50×50φ1.9μm, Depth2.3μm, Pitch3.0μm□50mm□50mmSilicon(Si)Hexagonal

Pillar

Commodity Code Dimension of Structure Effective Area Stamp Dimension MaterialArray
NAP100/100/400-30X30φ100nm, Height:100nm, Pitch:400nm□30mm□40mmNickel(Ni)Square
MLP230/500/460-φ120φ230nm, Height:500nm, Pitch:460nmφ120mmφ120mmSilicon(Si)Hexagonal
NAP230/100/460-30X30φ230nm, Height:100nm, Pitch:460nm□30mm□40mmNickel(Ni)Hexagonal
NAP230/200/340-30X30φ230nmnm, Height:200nm, Pitch:340nm □30mm□40mmNickel(Ni)Hexagonal
NAP230/200/460-30X30φ230nm, Height:200nm, Pitch:460nm□30mm□40mmNickel(Ni)Square
MLP230/200/460-φ120φ230nm, Height:200nm, Pitch:460nm φ120mmφ120mmSilicon(Si)Hexagonal
NAP230/200/690-30X30φ230nmnm, Height:200nm, Pitch:690nm □30mm□40mmNickel(Ni)Hexagonal
NAP230/200/690-30X30φ230nmnm, Height:200nm, Pitch:690nm□30mm□40mmNickel(Ni)Square
NAP250/500/500-30×30φ250nm, Height:500nm, Pitch:500nm□30mm□40mmNickel(Ni)Hexagonal
NAP250/250/1000-20×20φ250nm, Height:250nm, Pitch:1000nm□20mm□30mmNickel(Ni)Square
NAP270/200/530-30X30φ270nm, Height:200nm, Pitch:530nm□30mm□40mmNickel(Ni)Hexagonal
NAP300/300/600-20×20φ300nm, Height:300nm, Pitch:600nm□20mm□25mmNickel(Ni)Hexagonal
NAP300/600/600-30X30φ300nm, Height:600nm, Pitch:600nm□20mm□25mmNickel(Ni)Hexagonal
NAP300/600/800-30X30 φ300nm, Height:600nm, Pitch:800nm□20mm□25mmNickel(Ni)Square
NAP310/200/620-30X30 φ310nm, Height:200nm, Pitch:620nm □30mm□40mmNickel(Ni)Hexagonal
NAP400/200/600-30X30φ400nm, Height:200nm, Pitch:600nm□30mm□40mmNickel(Ni)Hexagonal
NAP400/200/600-30X30φ400nm, Height:200nm, Pitch:600nm□30mm□40mmNickel(Ni)Square
NAP400/400/600-30X30 φ400nm, Height:400nm, Pitch:600nm□30mm□40mmNickel(Ni)Square
NAP500/250/1000-20×20φ500nm, Height:250nm, Pitch:1000nm□20mm□30mmNickel(Ni)Square
NAP600/400/800-30X30φ600nm, Height:400nm, Pitch:800nm□30mm□40mmNickel(Ni)Hexagonal
NAP600/400/800-30X30 φ600nm, Height:400nm, Pitch:800nm□30mm□40mmNickel(Ni)Square
NAP2000/500/5000-30X30φ2000nm, Height:500nm, Pitch:5000nm□30mm□40mmNickel(Ni)Square

Plural

Commodity CodeDimension of Structure Effective AreaStamp Dimension MaterialArray
NA250/250/500-20×20
(PILLAR、LS)
φ250nm, Height:250nm, Pitch:500nm
Width:250 nm, Height:250nm, Pitch:500nm
□20mm□30mmNickel(Ni) Square

Custom Molded Examples

According your requests, from evaluation to volume production, various custom molds can be can be fabricated. According to pattern size, SCIVAX uses 7 different mold processes for fabrication.

Compound Custom Mold

More than two patterns of your request can be fabricated onto a single mold.

Mold Material: Ni
Pattern: Pillar (picture in the right), L&S (picture in the left)
L&S: Width 250nm, Height 250nm, Pitch 500nm
Pillar: φ250nm, Height 250nm, Pitch 500nm

Low Cost NIL Mold

We can fabricate a mold according to your specification (Material: Si, Ni).

複合カスタムモールド

​​Pattern: L&S, Pillar, Hole, etc.
Pattern Size: 150nm~
Pattern Area: □10mm~□30mm
Material: Si, Ni

Line & Space
Hole Pattern and Pillar Pattern

Large-Area Custom Mold

Replication service is available for Ni electroformed mold.

Ni電鋳モールド (200nmピラー、高さ500nm)

Ni Electroformed Mold
(200nm Pillar, Height 500nm)

8″ Ni Electroformed Mold
(Replica Mold from φ200nm Pillar)

Ni electroformed replica mold can be fabricated from silicon mold.

Silicon mold (200nm Pillar, Height 500nm)
Silicon mold (Honeycomb, One side: 1μm, Wall-thickness 240nm)
シリコンモールド(ハニカム 一辺1μm、壁厚240nm)
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