Nanoimprint Equipment
Nanoimprint Equipment
●High molding reproducibility, essential for mass production
●Batch transfer is possible from small to large areas
●Dual use of Heat way and UV system
●Multifunctional (“Vacuum treatments”, “Atmosphere control”, “High temperature imprint”, etc.)
●Ease of operation (simple, functional design that takes into account human movement)
●Clean room compatible (sealed drive unit)
●Please contact us for automatic mold release device.
Dyad® 200
Fully automated NIL Equipment
Design and manufactured by TAZMO and SCIVAX
Key Features
Function: Coating, Backing, Cooling, Replication, FOUP to FOUP
Cure method: UV
Press Method: FLAN*Air assisted(Scivax patented)
Alignment: ±1μｍ（option）
Wafer size: φ200mm
Wafter thickness: ⩾0.3mm
Throughput: 20wfs/hr
Please get in touch with us
for detailed specifications!
RubiQ® Type RD-100
There is a growing need from corporate R&D departments, universities and research institutes to purchase nanoimprinting equipment for the purpose of conducting basic research and processing experiments using a variety of materials.
SCIVAX has developed a revolutionary concept that is unprecedented in its ability to handle a wide variety of processes by taking advantage of the strengths of a nano-imprint equipment manufacturer and the process know-how cultivated through a track record of over 1,000 contracts.
Key Features
A total of 14 different SKUs can be selected by combining the following methods
Cure method: UV / Thermal / Both
Press Method: Parallel Plate / FLAN*Air assisted(Scivax patented) / Both
Drive system : Servo motor 20MPa / Air cylinder 10MPa
A variety of optional features
Automatic processing / Mold lift pin-up function / HEPA filter unit, Ionizer blower / High intensity UV LED unit / Pirani vacuum gauge (50Pa-)
The above methods and functions can be changed or added even after the installation.
| Type: | UV/Thermal Nanoimprint Equipment |
|---|---|
| Maximum work size: | φ100mm |
| Maximum load: | 20kN |
| Thermal specifications: | Heating temperature: 250°C Heating/cooling method: Heater/water cooling |
| UV specifications: | Wavelength：365nm llumination: 100㎜ W/㎠～ |
| Vacuum mechanism: | Available |
| External dimensions & weight: | W500×D700×H1700(㎜) 260㎏~ |
X300
This model can be used from R&D to pilot production.
| Type | UV/Thermal Nanoimprint Equipment |
|---|---|
| Transfer method | A collective Nanoimprint |
| Transferred material | UV Cure Resin, Thermoplastic Resin, Thermal Cure Resin |
| Maximum service temperature | 250℃、650℃（Option） |
| Maximum load | 50kN |
| Stage speed | Max. 15mm/sec, Min. 50nm/sec, Arbitrary operation speed, Backlash cancellation mechanism |
| Maximum work size | φ150mm |
| Standard work holding mechanism | Vacuum suction |
| UV function | Wavelength 365nm/385nm, UV irradiation area □100mm |
| Maximum pressure | 2MPa |
| Maximum service temperature | 100℃ |
| Vacuum mechanism | Vacuum chamber is standard |
| Vacuum pump | Standard target control pressure/300pa |
| Atmosphere control | Assume the vacuum chamber as an arbitrary gas atmosphere |
| Operation | Touch panel, PC Control/Data logger Automatic operation with 20 steps arbitrary operation circuit |
| External dimensions & weight | W900xH1,800xD1,300（mm） & 1,250kg |
X500
“This model can be used from R&D to pilot production.
(It can be used φ8″” maximum)”
| Type | UV/Thermal Nanoimprint Equipment |
|---|---|
| Transfer method | A collective Nanoimprint |
| Transferred material | UV Cure Resin, Thermoplastic Resin, Thermal Cure Resin |
| Maximum service temperature | 350℃ |
| Maximum load | 100kN |
| Stage speed | Max. 15mm/sec, Min. 50nm/sec, Arbitrary operation speed, Backlash cancellation mechanism |
| Maximum work size | φ200mm |
| Standard work holding mechanism | Vacuum suction |
| UV function | Wavelength 365nm/385nm, UV irradiation area φ200m |
| Maximum pressure | 2MPa |
| Maximum service temperature | 100℃ |
| Vacuum mechanism | Vacuum chamber is standard |
| Vacuum pump | Standard target control pressure/300pa |
| Atmosphere control | Assume the vacuum chamber as an arbitrary gas atmosphere |
| Operation | Touch panel, PC Control/Data logger Automatic operation with 20 steps arbitrary operation circuit |
| External dimensions & weight | W900xH1,990xD1,650（mm） & 1,500kg |
OptoSCAN700 （Macro Inspection Device）
This system can inspect mold and transfer film by macro optics.
Evaluation and inspection of pattern defects and non-uniformity of mold release agent application can be done in a short time by taking images of patterns of nano-imprinted mold and transfer film with a macro view.
●Mold Inspection and Analysis
●Compatible with various pattern shapes and mold materials (Ni, quartz, resin mold, etc.)
●Monitoring of mold release agent degradation/stripping
●Inspection and Analysis of Transferred Pattern Uniformity
●High-speed and high-sensitivity imaging made possible by proprietary technology
| Type | Defect inspection apparatus |
|---|---|
| Maximum work size | 300mmx300mm, 0.1mm～10mm thickness Please contact us for less than 0.1mm thickness. |
| Image sensor | 2,048 pixels, CCD line sensor camera (B/W) |
Demonstration with OptoScan700
The OptoScan-700 is a nano-pattern inspection system that has been receiving a lot of inquiries.
We can demonstrate the use of the OptoScan-700 in our facilities.
Contents of the demonstration
Option 1: Standard demonstration: Standard demonstration using our samples / about half a day
Option 2: Individual evaluation test: Evaluation test using samples brought in by the customer/ 1 to 2 days
Note about Option 2: Prior meeting and review are required.
For details, please contact us about this.
Place of the demonstration
SCIVAX Corporation (Kawasaki R&D Center)
NANOBIC 7-7,
Shinkawasaki,
Saiwai-ku, Kawasaki City,
Kanagawa Prefecture
212-0032