Nanoimprint Equipment
Nanoimprint Equipment
●Excellent mold reproducibility is implemented for a volume production
●A collective Nanoimprint technology is available for various size (from a small area to a large area)
●Thermal and UV methods are available
●Multifunctional (“Vacuum treatments”, “Atmosphere control”, “High temperature imprint”, etc.)
●Operability (Very simple and human friendly functional design)
●Clean room correspondence (Seal of actuator)
●Contact us for other Auto equipment suitable for volume production
Type of Nanoimprint Equipment
RubiQ Type RD-100
Compact and easy to use nanoimprint lithography(NIL) tool for R&D and pilot scale pattering. The modular design incorporates the porcessing capalibities and benefits of the SCIVAX foundry service technology.
Key Features
A total of 14 different SKUs can be selected by combining the following methods
Cure method: UV/Thermal/Both
Press Method: Parallel Plate/ FLAN*Air assisted(Scivax patented) /Both
Drive system : Servo motor 20MPa / Air cylinder 10MPa
A variety of optional features
Automatic operation, mold handling mechanism, high performance filter, static elimination mechanism, higher UV illumination, higher vacuum correspondence
The above methods and functions can be changed or added even after the installation.
| Type: | UV/Thermal Nanoimprint Equipment |
|---|---|
| Maximum work size: | φ100mm |
| Maximum load: | 20kN |
| Thermal specifications: | Heating temperature: 250°C Heating/cooling method: Heater/water cooling |
| UV specifications: | Wavelength：365nm llumination: 100㎜ W/㎠～ |
| Vacuum mechanism: | Available |
| External dimensions & weight: | W500×D700×H1700(㎜) 260㎏~ |
X300
This model can be used from R&D to pilot production.
| Type | UV/Thermal Nanoimprint Equipment |
|---|---|
| Transfer method | A collective Nanoimprint |
| Transferred material | UV Cure Resin, Thermoplastic Resin, Thermal Cure Resin |
| Maximum service temperature | 250℃、650℃（Option） |
| Maximum load | 50kN |
| Stage speed | Max. 15mm/sec, Min. 50nm/sec, Arbitrary operation speed, Backlash cancellation mechanism |
| Maximum work size | φ150mm |
| Standard work holding mechanism | Vacuum suction |
| UV function | Wavelength 365nm/385nm, UV irradiation area □100mm |
| Maximum pressure | 2MPa |
| Maximum service temperature | 100℃ |
| Vacuum mechanism | Vacuum chamber is standard |
| Vacuum pump | Standard target control pressure/300pa |
| Atmosphere control | Assume the vacuum chamber as an arbitrary gas atmosphere |
| Operation | Touch panel, PC Control/Data logger Automatic operation with 20 steps arbitrary operation circuit |
| External dimensions & weight | W900xH1,800xD1,300（mm） & 1,250kg |
X500
“This model can be used from R&D to pilot production.
(It can be used φ8″” maximum)”
| Type | UV/Thermal Nanoimprint Equipment |
|---|---|
| Transfer method | A collective Nanoimprint |
| Transferred material | UV Cure Resin, Thermoplastic Resin, Thermal Cure Resin |
| Maximum service temperature | 350℃ |
| Maximum load | 100kN |
| Stage speed | Max. 15mm/sec, Min. 50nm/sec, Arbitrary operation speed, Backlash cancellation mechanism |
| Maximum work size | φ200mm |
| Standard work holding mechanism | Vacuum suction |
| UV function | Wavelength 365nm/385nm, UV irradiation area φ200m |
| Maximum pressure | 2MPa |
| Maximum service temperature | 100℃ |
| Vacuum mechanism | Vacuum chamber is standard |
| Vacuum pump | Standard target control pressure/300pa |
| Atmosphere control | Assume the vacuum chamber as an arbitrary gas atmosphere |
| Operation | Touch panel, PC Control/Data logger Automatic operation with 20 steps arbitrary operation circuit |
| External dimensions & weight | W900xH1,990xD1,650（mm） & 1,500kg |
OptoSCAN700 （Macro Inspection Device）
Macro inspection of NIL molds and replica films is also possible. NIL molds and replica films are viewed in the macro visual field and any pattern defects or mold removal non-uniformity can be detected quickly.
●Mold Evaluation and Analysis
●Various Pattern Geometries and Mold Materials (Ni, Fused Silica, Resin, etc.)
●Monitoring of Release Agent Degradation and Film Delamination
●Evaluation and Analysis of Transferred Pattern Uniformity
●SCIVAX uses proprietary technology to achieve high speed and high sensitivity product imaging
| Type | Defect inspection apparatus |
|---|---|
| Maximum work size | 300mmx300mm, 0.1mm～10mm thickness Please contact us for less than 0.1mm thickness. |
| Image sensor | 2,048 pixels, CCD line sensor camera (B/W) |
Demonstration with OptoScan700
This model inspects nano-patterns, and it has many inquiries of prospective.
SCIVAX can demonstrate functionality of OptoScan-700.
Contents of the demonstration
1. Standard demo: It is the standard demonstration using our sample. It takes about a half day.
2. Individual evaluation test: It is the evaluation test using the sample that a visitor was brought. It takes 1 or 2 days.
Note: About item 2, we need a prior meeting and prior examination.
Please feel free to inquire for the details.
Place of the demonstration
SCIVAX Corporation (Kawasaki R&D Center)
Defect Inspection Examples
Equipment for Volume Production Services
With SCIVAX’s leading‐edge equipment, we can offer various Volume Production Service which is optimum for your needs.
| Feature | Specification | Remarks |
|---|---|---|
| Large Area Type | At most G5 (1,100mmX1,300mm) substrate | For Glass Substrate only |
| Multiple substrates | Available | Various wafer size is acceptable |
| Mold release mechanism | Available | Select the most suitable mold release method according to conditions |
| Alignment | Available |
NANOBIC 7-7,
Shinkawasaki,
Saiwai-ku, Kawasaki City,
Kanagawa Prefecture
212-0032