Nanoimprint Equipment
Nanoimprint Equipment
●High molding reproducibility, essential for mass production
●Batch transfer is possible from small to large areas
●Dual use of Heat way and UV system
●Multifunctional (“Vacuum treatments”, “Atmosphere control”, “High temperature imprint”, etc.)
●Ease of operation (simple, functional design that takes into account human movement)
●Clean room compatible (sealed drive unit)
●Please contact us for automatic mold release device.
Dyad® 200
Design and manufactured by TAZMO and SCIVAX
Key Features
Hard Replica Mold enabled lower distortion. Fully automated all-in-one NIL equipment.
All the NIL process is integrated: coating, baking/cooling, nanoimprint, demolding. In addition, alignment function is available as optional.
- Two loadports for imprint production
- Replica (working) mold production
- Bonding under vacuum environment*
*Reduce voids.
| Type: | Dyad® 200 |
|---|---|
| Curing method | UV |
| Wafer handling | FOUP to FOUP (8inch adapter for imprint & master mold) |
| Configurations | Spin coater x2 Bake and cool plate Alignment unit (optional) Imprint station De-molding station Transfer robots x3 Loadport: imprint x2, master mold x1, replica mold x1 |
| Work size | Φ200mm（0.3mm≦t≦1mm） |
| Master mold size/ Replica mold size | Φ200mm（0.3mm≦t≦1mm/ Φ300mm（0.7mm）） |
| UV | UV-LED 365nm |
| Maximum load | ≦0.90MPa |
| Vacuum | ≧50Pa |
| Demolding | Nearly vertical demolding angle |
| Alignment accuracy | ±1μm (optional) |
| Throughput | 20 wfs/hr (on SCIVAX specified process) |
| Dimensions | W5,460ｘＤ2,560ｘＨ2,500（mm） |
RubiQ® Type RD-100
There is a growing need from corporate R&D departments, universities and research institutes to purchase nanoimprinting equipment for the purpose of conducting basic research and processing experiments using a variety of materials.
SCIVAX has developed a revolutionary concept that is unprecedented in its ability to handle a wide variety of processes by taking advantage of the strengths of a nano-imprint equipment manufacturer and the process know-how cultivated through a track record of over 1,000 contracts.
Dowload the White paper
Key Features
A total of 14 different SKUs can be selected by combining the following methods
Cure method: UV / Thermal / Both
Press Method: Parallel Plate / FLAN*Air assisted(Scivax patented) / Both
Drive system : Servo motor 20MPa / Air cylinder 10MPa
A variety of optional features
Automatic processing / Mold lift pin-up function / HEPA filter unit, Ionizer blower / High intensity UV LED unit / Pirani vacuum gauge (50Pa-)
The above methods and functions can be changed or added even after the installation.
| Type: | UV/Thermal Nanoimprint Equipment |
|---|---|
| Maximum work size: | φ100mm |
| Maximum load: | 20kN |
| Thermal specifications: | Heating temperature: 250°C Heating/cooling method: Heater/water cooling |
| UV specifications: | Wavelength：365nm llumination: 100㎜ W/㎠～ |
| Vacuum mechanism: | Available |
| External dimensions & weight: | W500×D700×H1700(㎜) 260㎏~ |
NANOBIC 7-7,
Shinkawasaki,
Saiwai-ku, Kawasaki City,
Kanagawa Prefecture
212-0032