Nanoimprint Equipment

Nanoimprint Equipment​

●High molding reproducibility, essential for mass production
●Batch transfer is possible from small to large areas
●Dual use of Heat way and UV system
●Multifunctional (“Vacuum treatments”, “Atmosphere control”, “High temperature imprint”, etc.)
●Ease of operation (simple, functional design that takes into account human movement)
●Clean room compatible (sealed drive unit)

●Please contact us for automatic mold release device.

Type of Nanoimprint Equipment​

RubiQ Type RD-100

There is a growing need from corporate R&D departments, universities and research institutes to purchase nanoimprinting equipment for the purpose of conducting basic research and processing experiments using a variety of materials.

SCIVAX has developed a revolutionary concept that is unprecedented in its ability to handle a wide variety of processes by taking advantage of the strengths of a nano-imprint equipment manufacturer and the process know-how cultivated through a track record of over 1,000 contracts.


Key Features

A total of 14 different SKUs can be selected by combining the following methods

Cure method: UV / Thermal / Both

Press Method: Parallel Plate / FLAN*Air assisted(Scivax patented) / Both

Drive system : Servo motor 20MPa / Air cylinder 10MPa

A variety of optional features

Automatic processing / Mold lift pin-up function / HEPA filter unit, Ionizer blower / High intensity UV LED unit / Pirani vacuum gauge (50Pa-)

The above methods and functions can be changed or added even after the installation.

Type:UV/Thermal Nanoimprint Equipment
Maximum work size:φ100mm
Maximum load:20kN
Thermal specifications:Heating temperature: 250°C
Heating/cooling method: Heater/water cooling
UV specifications:Wavelength:365nm
llumination: 100㎜ W/㎠~
Vacuum mechanism:Available
External dimensions & weight:W500×D700×H1700(㎜)
260㎏~

X300

This model can be used from R&D to pilot production.

TypeUV/Thermal Nanoimprint Equipment
Transfer method A collective Nanoimprint
Transferred material UV Cure Resin, Thermoplastic Resin, Thermal Cure Resin
Maximum service temperature 250℃、650℃(Option)
Maximum load50kN
Stage speedMax. 15mm/sec, Min. 50nm/sec, Arbitrary operation speed, Backlash cancellation mechanism
Maximum work sizeφ150mm
Standard work holding mechanismVacuum suction
UV functionWavelength 365nm/385nm, UV irradiation area □100mm
Maximum pressure2MPa
Maximum service temperature 100℃
Vacuum mechanismVacuum chamber is standard
Vacuum pumpStandard target control pressure/300pa
Atmosphere controlAssume the vacuum chamber as an arbitrary gas atmosphere
OperationTouch panel, PC Control/Data logger
Automatic operation with 20 steps arbitrary operation circuit
External dimensions & weightW900xH1,800xD1,300(mm) & 1,250kg
熱式・UV式ナノインプリント装置 x300

X500

“This model can be used from R&D to pilot production.
(It can be used φ8″” maximum)”

TypeUV/Thermal Nanoimprint Equipment
Transfer methodA collective Nanoimprint
Transferred materialUV Cure Resin, Thermoplastic Resin, Thermal Cure Resin
Maximum service temperature350℃
Maximum load100kN
Stage speed Max. 15mm/sec, Min. 50nm/sec, Arbitrary operation speed, Backlash cancellation mechanism
Maximum work sizeφ200mm
Standard work holding mechanismVacuum suction
UV functionWavelength 365nm/385nm, UV irradiation area φ200m
Maximum pressure2MPa
Maximum service temperature
100℃
Vacuum mechanism Vacuum chamber is standard
Vacuum pumpStandard target control pressure/300pa
Atmosphere controlAssume the vacuum chamber as an arbitrary gas atmosphere
OperationTouch panel, PC Control/Data logger
Automatic operation with 20 steps arbitrary operation circuit
External dimensions & weightW900xH1,990xD1,650(mm) & 1,500kg
熱式、UV式ナノインプリント装置 x500

OptoSCAN700 (Macro Inspection Device)

This system can inspect mold and transfer film by macro optics.

Evaluation and inspection of pattern defects and non-uniformity of mold release agent application can be done in a short time by taking images of patterns of nano-imprinted mold and transfer film with a macro view.

 

●Mold Inspection and Analysis
●Compatible with various pattern shapes and mold materials (Ni, quartz, resin mold, etc.)
●Monitoring of mold release agent degradation/stripping
●Inspection and Analysis of Transferred Pattern Uniformity
●High-speed and high-sensitivity imaging made possible by proprietary technology

TypeDefect inspection apparatus
Maximum work size300mmx300mm, 0.1mm~10mm thickness
Please contact us for less than 0.1mm thickness.
Image sensor 2,048 pixels, CCD line sensor camera (B/W)
マクロ欠陥検査装置 OptoScan-700(マクロ検査装置)
Demonstration with OptoScan700

The OptoScan-700 is a nano-pattern inspection system that has been receiving a lot of inquiries.

We can demonstrate the use of the OptoScan-700 in our facilities.

Contents of the demonstration

Option 1: Standard demonstration: Standard demonstration using our samples / about half a day
Option 2: Individual evaluation test: Evaluation test using samples brought in by the customer/ 1 to 2 days
Note about Option 2: Prior meeting and review are required.

For details, please contact us about this.

Place of the demonstration

SCIVAX Corporation (Kawasaki R&D Center)

Defect Inspection Examples

Equipment for Volume Production Services

We offer mass production equipment optimized for your product process.

Feature SpecificationRemarks
Large Area TypeAt most G5 (1,100mmX1,300mm) substrateFor Glass Substrate only
Multiple substratesAvailableVarious wafer size is acceptable
Mold release mechanismAvailableSelect the most suitable mold release method according to conditions
AlignmentAvailable
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