Visual inspection is a very important elemental technology for the mass production of nanoimprint-based microfabrication.
We support our customers from prototyping to mass production based on a variety of inspection technologies, including a cutting-edge high-speed visual inspection system (INSPECTRA).
Primary Application: Automatic macro analysis of wafer or film surface
Resolution | 1.4μm、3.5μm |
Magnification | 2X or 5X |
Minimum Detectable Defect: | 2μm |
Substrate Size: | Max 300mm square |
Throughput (6" wafers): | about 50 wph |
System: | OPTOSCAN |
Primary Applications: | ●Features・・・using telocentric optics, micron order level pattern non-uniformity, micro-scratches, particles, resin non-uniformity can all be confirmed with high-speed |
Primary Features: | Measurement area・・・~300mm□ |
The macro optical system can be used to evaluate molds and transfer films. It is possible to evaluate and inspect pattern defects and non-uniformity of the release agent coating in a short time by capturing the image of the pattern on the nanoimprint mold or transfer film in a macro view.
●Mold Evaluation and Analysis
●Various Pattern Geometries and Mold Materials (Ni, Fused Silica, resin, etc.)
●Monitoring of Release Agent Degradation and Film Delamination
●Evaluation and Analysis of Transferred Pattern Uniformity
●SCIVAX uses proprietary technology to achieve high speed and high sensitivity product imaging
Primary Applications: | Inspection of nanometer level patterns |
Primary Features/Resolution: | 1.3nm (imaging voltage 1kV) |
Imaging Voltage Range: | 0.1 to 30 kV |
Magnification: | up to 2,000,000X |
System Name: | Dimension Icon |
Primary Applications & Features: | Can handle large area samples with its scanning probe microscopy function. |
Primary Functions: | The system can measure pattern dimensions and step heights with atomic level resolution. |
System Type: | NIR Microspectroscope |
Primary Applications: | Features・・・Optically measures the reflectivity and thickness of film/patterns |
Primary Features: | Measurement wavelength・・・380nm~1050nm Measurement Repeatability (Reflectivity)・・・<= ±0.02%(when using 10X, 20X objective lens; 430~1,010nm) Measurement Repeatability (Film Thickness)・・・±1% |
System Type: | Laser Microscope |
Main Applications: | Features・・・Can perform 3D measurement of patterns and resist geometry and height |
Features: | Imaging Resolution = 0.2μm Height Resolution: 0.01μm |
・FE-SEM
・AFM
・Confocal Microscopy
・CNC 3D Measurement
・Film Thickness Measurement
・Reflectivity Measurement
NANOBIC 7-7,
Shinkawasaki,
Saiwai-ku, Kawasaki City,
Kanagawa Prefecture
212-0032