With our originally developed Large Area Nanoimprint Technology, the cost for processing can be drastically reduced, so it is spreading to various applications now.
“For large area glass: single-shot fabrication on G5 (1,100mm X1,300mm)” and “For wafer fabrication: high throughput at most φ8 inches” can be done.
Only with Nanoimprint Technology, a volume production can’t be realized. We make an effort for the fusion technology which is required for practical application, then we have constructed our original Foundry Platform for nanoscale patterning. Using our Foundry Service, you can drastically shorten your development time for new products.
・Single-shot fabrication on large area
Single-shot fabrication at most G5 (1,100mmX1,300mm) substrate
Single-shot fabrication for multiple substrates
・Nanoimprint for substrates with some warpage or non-flatness
Single-shot fabrication for substrates that flatness is not guaranteed
・Nanoimprint onto inorganic substrates
Fabrication onto other materials (Such as SiO2)
・Nanoimprint onto curved surfaces
Fabrication onto curved surfaces, which include lens surface (concave or convex)
The global alignment accuracy across wafer (φ8”) is ±3μm.
|Measure a position gap between master mold and fabricated wafer|
Measure a position gap between master mold and fabricated wafer
Using Nanoimprint technology with high accuracy, alignment error can be controlled within ±3μm
Uniform patterning onto substrates with some warpage or non-flatness can be done.
Molding onto lens surfaces (concave, convex, and both) can be done.
We have many patterning experiences onto resin film/substrate.
Uniform patterning at most G5 (1,100mmX1,300mm) substrate can be done.
Glass substrate: Offered by Tokyo Electron、Ltd.
Resin composition for imprint: Made in Toyo Gosei Co., Ltd.