Feature of SCIVAX’s Nanoimprint Technology

Feature of SCIVAX's Nanoimprint Technology

"Nanoimprint onto large area" open up the future of super nanofabrication technology​

Nanoimprint onto large areaWith our originally developed Large Area Nanoimprint Technology, the cost for processing can be drastically reduced, so it is spreading to various applications now.
“For large area glass: single-shot fabrication on G5 (1,100mm X1,300mm)” and “For wafer fabrication: high throughput at most φ8 inches” can be done.

Nanoimprint Foundry Service (Volume Production Service)

Nanoimprint Foundry Service (Volume Production Service)

Only with Nanoimprint Technology, a volume production can’t be realized. We make an effort for the fusion technology which is required for practical application, then we have constructed our original Foundry Platform for nanoscale patterning. Using our Foundry Service, you can drastically shorten your development time for new products.

SCIVAX's Nanoimprint Technology

Nanoimprint on rigid substrate・Single-shot fabrication on large area
Single-shot fabrication at most G5 (1,100mmX1,300mm) substrate
・Multi-Nanoimprint
Single-shot fabrication for multiple substrates
・Nanoimprint for substrates with some warpage or non-flatness
Single-shot fabrication for substrates that flatness is not guaranteed
・Nanoimprint onto inorganic substrates
Fabrication onto other materials (Such as SiO2)
・Nanoimprint onto curved surfaces
Fabrication onto curved surfaces, which include lens surface (concave or convex)

Alignment Technology

The global alignment accuracy across wafer (φ8”) is ±3μm.

Measure a position gap between master mold and fabricated wafer

Measure a position gap between master mold and fabricated wafer

Using Nanoimprint technology with high accuracy, alignment error can be controlled within ±3μm

Pattern transfer with high accuracy

For L&S with 100nm pitch, we can fabricate a pattern with precision less than 0.1nm.

Some examples of our processing technology

Patterning onto sapphire substrates or compound semiconductors

Uniform patterning onto substrates with some warpage or non-flatness can be done.

Patterning onto lens curved surfaces

Molding onto lens surfaces (concave, convex, and both) can be done.

Patterning onto resin

We have many patterning experiences onto resin film/substrate.

Patterning onto large-area glass substrates

Uniform patterning at most G5 (1,100mmX1,300mm) substrate can be done.
Glass substrate: Offered by Tokyo Electron、Ltd.
Resin composition for imprint: Made in Toyo Gosei Co., Ltd.

PAGE TOP