Feature of SCIVAXʼs
Nanoimprint Technology

Experts in
Extensive Experience
with Over 1000
Equipment for
Manufacturing a
Wide Array of Devices
A One-Stop Solution for
the Materialization of
Mass Production and
Processing Systems

Feature of SCIVAX's Nanoimprint Technology

"Nanoimprint onto large area" opens up the future of super nanofabrication technology

With our originally developed Large Area Nanoimprint Technology, the cost for processing can be drastically reduced, so it is spreading to various applications now.
“For large area glass: single-shot fabrication on G5 (1,100mmX1,300mm)” and “For wafer fabrication: high throughput at most φ8 inches” can be done.

Nanoimprint Foundry Service
(Volume Production Service)

Only with Nanoimprint Technology, a volume production can’t be realized. We make an effort for the fusion technology which is required for practical application, then we have constructed our original Foundry Platform for nanoscale patterning. Using our Foundry Service, you can drastically shorten your development time for new products.

SCIVAX's Nanoimprint

Alignment Technology

The global alignment accuracy across wafer (φ8” ) is ±3μm.

Pattern transfer with
high accuracy

For L&S with 100nm pitch, we can fabricate a pattern with precision at less than 0.1nm.


Some examples of our processing technology​

Patterning onto sapphire substrates or compound semiconductors

Uniform patterning onto substrates with some warpage or non-flatness can be done.

Patterning onto lens curved surfaces​

Molding onto lens surfaces (concave, convex, and both) can be done.

Patterning onto resin​

We have many patterning experiences onto resin film/substrate.

Patterning onto large-area
glass substrates​

Uniform patterning at most G5 (1,100mmX1,300mm) substrate
can be done.