Low cost production solution for NGS

Low cost production solution for NGS

Nanoimprinting can contribute fabricating ≦0.5um diameter well structures that the standard i-Line Photography technically can’t handle.

Low manufacturing cost

Other Advancement of Scivax:

・Optical Design & Simulation
・Wafer size up to 12”
・Chemical surface treatment and process(Hydrophilicity, Hydrophobicity, etc.)

Typical Process Flow

Glass Substrate

Ashing to expose
Glass surface inside hole

Hydrophobicity (e.g. HMDS) surface treatment

Hydrophilicity (e.g.γAPTES)
deposition

Coat Nanoimprinting
Resin

Lift off Nanoimprinting

Resin

Nanoimprint

process

Au nanoparticle treatment to check Hydrophilic surface property

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