Low cost production solution for NGS

The nano-imprinting process facilitates the formation of wells with a diameter of ≤0.5um, which is difficult to form by i-line lithography.

This is a great advantage in terms of cost for mass production.

Other Advancement of Scivax：

・Optical Design & Simulation
・Wafer size up to 12”
・Chemical surface treatment and process(Hydrophilicity, Hydrophobicity, etc.)