What is Nanoimprint Technology?
SCIVAX can, of course, process silicon wafers, but also wide variety of other substrates including compound semiconductor wafers. Large area glass substrates can also be imprinted in our foundry with SCIVAX’s unique single-shot NIL technology.
SCIVAX technology has been used in concert with other technologies to allow the first ever large area substrate single-shot nanoimprint pattern transfer.
① Uniform molding technology
② Compliant molding technology for substrates with some warpage or non-flatness
③ Residual Layer Control Technology
④ Auto Mold Release Technology
⑤ Bubble Defect Reduction Technology
⑥ Particle Defect Reduction Technology
⑦ Alignment Technology
G5 (1,100mmX1,300mm) Glass Panel NIL Achieved!
Batch nanoimprinting is possible for various substrates ranging from silicon substrates, compound semiconductor substrates to large glass substrates.
Residual film controlled to less than 10 nm
SCIVAX has established a team of specialists with expertise in each critical technical area to deliver a total nano-foundry process capability from selection of ideal resins, to the NIL process and pre/post processing.
SCIVAX offers its standard molds and molded products for sale, which can be used for R&D or basic evaluations of standard nano-patterns.
We make prototypes using test molds (ready-made molds are used). We carry out basic evaluation including principle verification.
Once a good result is achieved in pilot production, patterns can be optimized. We encourage customers to take advantage of SCIVAX’s optical simulation, mold fabrication know-how, and foundry services.
Product prototypes are manufactured using pattern-optimized molds.
We develop processes to achieve mass production.
Foundry production is conducted in a high-level, well managed state-of-art facility.
Substrates of various sizes and materials can be processed
◯Pattern Size: 20nm～a few hundred μm
◯Substrate: All kinds of wafers (silicon, sapphire, compound semiconductor, other), Glass Substrates, Glass Lenses, Metal Substrates, Resin Films/Sheets
Processing of Anti-reflection Nanostructures (“Moth-Eye”) onto Films
Processing of Anti-reflection onto Lens Surfaces
Processing of 12″ Silicon Wafers
Nano-patterning of Resin Films (COP)
Nano-patterning of Glass Substrates
Nano-patterned 6″ Sapphire Wafer
Light diffraction with diffractive optical elements (DOE)
Diffractive Optical Elements (DOE)
SCIVAX has nanoimprinted resin film samples available for sale. The details can be found at the link below:
SCIVAX has standard NIL molds available for sale. The details can be found at the link below:
|Substrate||Maximum Size for Molding|
|Thin Metal Film/Foil|
|Resin Substrate||Please contact us.|
|UV Cure Resin||Epoxy Type Resin, Acrylic Resin, Urethane Resin|
|Thermoplastic Resin||General Plastic, Engineering Plastics, Super Engineering Plastics|
|Thermal Cure Resin|
|Others||Various Inorganic Materials|
Saiwai-ku, Kawasaki City,
|What is Nanoimprinting?|
|Experts in Nanoimprint||Solution to Customer Inquiries||Equipment for Nanoimprint Foundry||A One-Stop Solution for Mass Production|
|Optical Design and Simulation|
|Custom Mold Fabrication|
|Deposition / Evaporation|
|Etching & Cleaning|
|Inspection & Measurement|
|Production Foundry Services|