Do you have trouble with etching with nano-imprint resists? We can help you solve various dry-etching issues related to nano-imprinted resists.
We can handle substrate size, types of film to be etched, and various pattern sizes.
We can provide a full range of services from resist mask formation by nanoimprinting to etching optimization.
|■Films that can be etched||●Silicon ●SiOx ●Glass ●sapphire ●All types of metal layers ●All types of compound semiconductor layers|
|■Etching Geometries||●Hole ●Pillar ●Line&Space ●Cones ●Other|
|Pattern Size||●20nm～several tens of μm|
|■Equipment||●ICP & RIE Etchers|
The etching rate control solves the problem of residual film etching.
The problem of resist shortage is solved by controlling the etching selection ratio.
Various shapes can be controlled.
SCIVAX is able to provide consulting services regarding etching processes. Please feel free to inquire.
Limited to etching of NIL processed substrates.
Confirmation of Specification
We will ask about the substrate and film type, as well as the shape, dimensions and accuracy to be used.
We offer technical consulting regarding equipment, gases and process conditions.
Step-by-step recommendations can be made to fit your budget.
We deliver high quality samples based on our extensive experience and high technology.
Saiwai-ku, Kawasaki City,
|What is Nanoimprinting?|
|Experts in Nanoimprint||Solution to Customer Inquiries||Equipment for Nanoimprint Foundry||A One-Stop Solution for Mass Production|
|Optical Design and Simulation|
|Custom Mold Fabrication|
|Deposition / Evaporation|
|Etching & Cleaning|
|Inspection & Measurement|
|Production Foundry Services|