We provide not only nanoimprinting but also injection molding and other types of mold for various types of fine molding.
We provide a wide range of services from small molds for R&D to large molds for mass production to meet your needs.
We offer low-cost Si substrate molds made with the most advanced semiconductor processes.
You can choose from a lineup of mold sizes from 10 mm square to 300 mm diameter.
Commodity Code | Dimension of Structure | Effective Area | Stamp Dimension | Material | Array |
---|---|---|---|---|---|
MALS250/500/500-30×30 | Width:250nm, Height:500nm, Pitch:500nm | □30mm | □40mm | Silicon(Si) | - |
NALS250/500/500-30X30 | Width:250nm, Height:500nm, Pitch:500nm | □30mm | □40mm | Nickel(Ni) | - |
MTLS1/1/2-50×50 | Width:1μm, Height:1μm, Pitch:2μm | □50mm | □50mm | Silicon(Si) | - |
MTLS1/2/2-50×50 | Width:1μm, Height:2μm, Pitch:2μm | □50mm | □50mm | Silicon(Si) | - |
MALS5/1/10-30×30 | Width:5μm, Height:1μm, Pitch:10μm | □30mm | □40mm | Silicon(Si) | - |
NALS5/1/10-30×30 | Width:5μm, Height:1μm, Pitch:10μm | □30mm | □40mm | Nickel(Ni) | - |
NALS500/250/1000-20×20 | Width:500nm, Height:250nm, Pitch:1000nm | □20mm | □30mm | Nickel(Ni) | - |
φ230nm
Height200nm
Pitch460nm
Commodity Code | Dimension of Structure | Effective Area | Stamp Dimension | Material | Array |
---|---|---|---|---|---|
NAP100/100/400-30X30 | φ100nm, Height:100nm, Pitch:400nm | □30mm | □40mm | Nickel(Ni) | Square |
MLP230/500/460-φ120 | φ230nm, Height:500nm, Pitch:460nm | φ120mm | φ120mm | Silicon(Si) | Hexagonal |
NAP230/100/460-30X30 | φ230nm, Height:100nm, Pitch:460nm | □30mm | □40mm | Nickel(Ni) | Hexagonal |
NAP230/200/340-30X30 | φ230nmnm, Height:200nm, Pitch:340nm | □30mm | □40mm | Nickel(Ni) | Hexagonal |
NAP230/200/460-30X30 | φ230nm, Height:200nm, Pitch:460nm | □30mm | □40mm | Nickel(Ni) | Square |
MLP230/200/460-φ120 | φ230nm, Height:200nm, Pitch:460nm | φ120mm | φ120mm | Silicon(Si) | Hexagonal |
NAP230/200/690-30X30 | φ230nmnm, Height:200nm, Pitch:690nm | □30mm | □40mm | Nickel(Ni) | Hexagonal |
NAP230/200/690-30X30 | φ230nmnm, Height:200nm, Pitch:690nm | □30mm | □40mm | Nickel(Ni) | Square |
NAP250/500/500-30×30 | φ250nm, Height:500nm, Pitch:500nm | □30mm | □40mm | Nickel(Ni) | Hexagonal |
NAP250/250/1000-20×20 | φ250nm, Height:250nm, Pitch:1000nm | □20mm | □30mm | Nickel(Ni) | Square |
NAP270/200/530-30X30 | φ270nm, Height:200nm, Pitch:530nm | □30mm | □40mm | Nickel(Ni) | Hexagonal |
NAP300/300/600-20×20 | φ300nm, Height:300nm, Pitch:600nm | □20mm | □25mm | Nickel(Ni) | Hexagonal |
NAP300/600/600-30X30 | φ300nm, Height:600nm, Pitch:600nm | □20mm | □25mm | Nickel(Ni) | Hexagonal |
NAP300/600/800-30X30 | φ300nm, Height:600nm, Pitch:800nm | □20mm | □25mm | Nickel(Ni) | Square |
NAP310/200/620-30X30 | φ310nm, Height:200nm, Pitch:620nm | □30mm | □40mm | Nickel(Ni) | Hexagonal |
NAP400/200/600-30X30 | φ400nm, Height:200nm, Pitch:600nm | □30mm | □40mm | Nickel(Ni) | Hexagonal |
NAP400/200/600-30X30 | φ400nm, Height:200nm, Pitch:600nm | □30mm | □40mm | Nickel(Ni) | Square |
NAP400/400/600-30X30 | φ400nm, Height:400nm, Pitch:600nm | □30mm | □40mm | Nickel(Ni) | Square |
NAP500/250/1000-20×20 | φ500nm, Height:250nm, Pitch:1000nm | □20mm | □30mm | Nickel(Ni) | Square |
NAP600/400/800-30X30 | φ600nm, Height:400nm, Pitch:800nm | □30mm | □40mm | Nickel(Ni) | Hexagonal |
NAP600/400/800-30X30 | φ600nm, Height:400nm, Pitch:800nm | □30mm | □40mm | Nickel(Ni) | Square |
NAP2000/500/5000-30X30 | φ2000nm, Height:500nm, Pitch:5000nm | □30mm | □40mm | Nickel(Ni) | Square |
φ500nm
Depth500nm
Pitch4000nm
Commodity Code | Dimension of Structure | Effective Area | Stamp Dimension | Material | Array |
---|---|---|---|---|---|
MAH100/100/400-30X30 | φ100nm, Depth:100nm, Pitch:400nm | □30mm | □40mm | Silicon(Si) | Square |
MAH250/500/500-30×30 | φ250nm, Depth:500nm, Pitch:500nm | □30mm | □40mm | Silicon(Si) | Hexagonal |
MLH230/200/460-φ120 | φ230nm, Depth:200nm, Pitch:460nm | φ120mm | φ120mm | Silicon(Si) | Hexagonal |
MAH300/300/600-30X30 | φ300nm, Depth:300nm, Pitch:600nm | □20mm | □25mm | Silicon(Si) | Hexagonal |
MAH300/600/600-30X30 | φ300nm, Depth:600nm, Pitch:600nm | □20mm | □25mm | Silicon(Si) | Hexagonal |
MAH300/600/800-30X30 | φ300nm, Depth:600nm, Pitch:800nm □ | □20mm | □25mm | Silicon(Si) | Square |
MTH500/500/1000 | φ500nm, Depth:500nm, Pitch:1000nm | □50mm | □50mm | Silicon(Si) | Hexagonal |
NAH2000/500/5000-30X30 | φ2000nm, Depth:500nm, Pitch:5000nm | □30mm | □40mm | Nickel(Ni) | Square |
MTH1.9/2.3/3-50×50 | φ1.9μm, Depth3.3μm, Pitch3.0μm | □50mm | □50mm | Silicon(Si) | Hexagonal |
We offer a variety of molds that can be manufactured according to our customer’s requirements.
We can fabricate molds in Si, Ni(NiP), SUS and quartz, using seven different methods to cover all sizes required for micro machining.
We also manufacture molds using the latest semiconductor technologies such as EB writing, laser writing, and high-speed writing, as well as injection molding technology (machining).
Pattern | ●Pillar ●Hole ●L&S ●Honeycomb ●Square ●Lens Array ●Blazed ●Retroreflector |
Feature Size | Several tens of nm ~ Several μm (a few tens of nm to several micron) |
Processing Area | □few mm ~ φ12" |
Material | ●Silicon ●SUS ●Ni ●Fused Silica |
φ | 30nm~ |
Height | 30nm~ |
Pitch | 60nm~ |
Pattern Area | □several mm~φ300mm |
φ | 30nm~ |
Height | 30nm~ |
Pitch | 60nm~ |
Pattern Area | □several mm~φ300mm |
φ | 30nm~ |
Height | 30nm~ |
Pitch | 60nm~ |
Pattern Area | □several mm~φ300mm |
Two-Type and Four-Type mixed patterns (e.g. pillar/hole/L&S, etc.) are possible (same height for whole pattern).
Diameter and width | 100nm~ |
Height | 100nm~ |
Pitch | 200nm~ |
Pattern Area | □10mm~50mm |
We provide large area mold for mass production.
We produce 12 inch diameter mold pattern boundary by using the most advanced semiconductor technology with high precision joints. We can fabricate high precision patterns on the entire surface of 12 inches.
NANOBIC 7-7,
Shinkawasaki,
Saiwai-ku, Kawasaki City,
Kanagawa Prefecture
212-0032