A One-Stop Solution for the Materialization of Mass Production and Processing Systems

Why does mass production of nanoimprinting fail?

Example causes:

  • simulation results and actual prototype results not matching
  • mold not made well
  • not possible to select a resin for which adequate performance is ensured
  • not possible to achieve a match with etching processing
  • unsure of how to appropriately inspect product quality

These are issues that many companies directly face when tackling mass production that uses nanoimprint technology.

Nanoimprint technology, which has lower costs than conventional technology and is capable of ultra-microfabrication, is being seen as a recent, cutting-edge technology for producing devices, and, amongst its other qualities, it lowers mass-production costs, improves the performance of conventional products, and makes new products and applications possible.

On the other hand, as nanoimprinting is a technology that differs in appearance from embossing technology, there are many cases of simple imprint equipment being introduced and the introduction of mass production being abandoned as a result of using that imprint equipment with a process of trial and error.

Causes of failure in mass production

Nanoimprint technology is a technology for which not much time has passed since it was first practically applied.

At long last, nanoimprint technology is gaining recognition as a technology with practical applications. But it is still a technology with a short history. And in order to mass produce nanoimprint technology, various knowhow is required.

Many companies introduce nanoimprint technology believing that it’s mass production is akin to mass producing semiconductors. But the circumstances are greatly different from those of the semiconductor production process, which are set based on a standard process recipe.
In one sense, if the recipe is followed, the production will differ from mass production for a good semiconductor, and, one by one, it will be necessary to optimize the processes and materials.

An example of this is selecting resin for moldings.

Naturally, for the used resin, it must be possible to mold it evenly and at the desired film thickness; nanoimprinting must, of course, be possible; and it must have the requisite characteristics (optical characteristics, etching characteristics, and other characteristics).

However, the types of commercially available nanoimprint-use resin are limited, so, in most cases, customizing is required.

In addition, general rules of thumb and knowhow are required for each process, such as those for optimizing the master mold’s shape such that it is appropriate for imprint production, selecting resin for replica molds, and optimizing mold processes to match the shape and resin. Furthermore, there are an immense amount of matters that must be considered before introducing mass production, such as controlling and removing the remaining film, etching processes, and effective inspection processes.

One-stop solution for nanoimprinting

SCIVAX has gathered together engineers who have led R&D and production of products at major manufacturers and research institutions in various fields (engineers in optical design, semiconductor process design and production, material design, mold design, equipment design and production, etc.) and those engineers are now tackling nanoimprint development.

Since our founding in 2004, we have devoted ourselves to nanoimprint.

While developing nanoimprint production equipment, we are working on all nanoimprinting processes, from simulation to prototype design, mass production, and inspection. In 2018, the number of contracted development projects exceeded 1000.

The strength of SCIVAX is that, by utilizing our vast experience and knowhow, we can respond the various needs of customers.