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Inspection & Measurement

Inspection of All Types of Nano-patterns

Visual inspection is a very important elemental technology for the mass production of nanoimprint-based microfabrication.

We support our customers from prototyping to mass production based on a variety of inspection technologies, including a cutting-edge high-speed visual inspection system (INSPECTRA).

Metrology System Lineup

Wafer Inspection system: INSPECTRA

Primary Application: Automatic macro analysis of wafer or film surface

Primary Features & Options

Resolution	1.4μm、3.5μm
Magnification	2X or 5X
Minimum Detectable Defect:	2μm
Substrate Size：	Max 300mm square
Throughput (6" wafers)：	about 50 wph

Inspection Examples

Details of Large Area Pattern Inspection System

System：	OPTOSCAN
Primary Applications：	●Features・・・using telocentric optics, micron order level pattern non-uniformity, micro-scratches, particles, resin non-uniformity can all be confirmed with high-speed
Primary Features：	Measurement area・・・～300mm□

Large Area Nano-pattern Inspection System: OptoScan 700

The macro optical system can be used to evaluate molds and transfer films. It is possible to evaluate and inspect pattern defects and non-uniformity of the release agent coating in a short time by capturing the image of the pattern on the nanoimprint mold or transfer film in a macro view.

●Mold Evaluation and Analysis
●Various Pattern Geometries and Mold Materials (Ni, Fused Silica, resin, etc.)
●Monitoring of Release Agent Degradation and Film Delamination
●Evaluation and Analysis of Transferred Pattern Uniformity
●SCIVAX uses proprietary technology to achieve high speed and high sensitivity product imaging

Scanning Electron Microscope

Primary Applications：	Inspection of nanometer level patterns
Primary Features/Resolution：	1.3nm (imaging voltage 1kV)
Imaging Voltage Range：	0.1 to 30 kV
Magnification：	up to 2,000,000X

Atomic Force Microscope (AFM)

System Name：	Dimension Icon
Primary Applications & Features：	Can handle large area samples with its scanning probe microscopy function.
Primary Functions：	The system can measure pattern dimensions and step heights with atomic level resolution.

Film Reflectivity/Thickness Measurement Equipment

System Type：	NIR Microspectroscope
Primary Applications：	Features・・・Optically measures the reflectivity and thickness of film/patterns
Primary Features：	Measurement wavelength・・・380nm～1050nm Measurement Repeatability (Reflectivity)・・・<= ±0.02%（when using 10X, 20X objective lens; 430～1,010nm) Measurement Repeatability (Film Thickness)・・・±1%

3D Measurement System

System Type：	Laser Microscope
Main Applications：	Features・・・Can perform 3D measurement of patterns and resist geometry and height
Features：	Imaging Resolution = 0.2μm Height Resolution: 0.01μm