Nanoimprint Equipment
Nanoimprint Equipment
●High molding reproducibility, essential for mass production
●Batch transfer is possible from small to large areas
●Dual use of Heat way and UV system
●Multifunctional (“Vacuum treatments”, “Atmosphere control”, “High temperature imprint”, etc.)
●Ease of operation (simple, functional design that takes into account human movement)
●Clean room compatible (sealed drive unit)
●Please contact us for automatic mold release device.
Dyad® 200
Design and manufactured by TAZMO and SCIVAX
Key Features
Hard Replica Mold enabled lower distortion. Fully automated all-in-one NIL equipment.
All the NIL process is integrated: coating, baking/cooling, nanoimprint, demolding. In addition, alignment function is available as optional.
- Two loadports for imprint production
- Replica (working) mold production
- Bonding under vacuum environment*
*Reduce voids.
| Type: | Dyad® 200 |
|---|---|
| Curing method | UV |
| Wafer handling | FOUP to FOUP (8inch adapter for imprint & master mold) |
| Configurations | Spin coater x2 Bake and cool plate Alignment unit (optional) Imprint station De-molding station Transfer robots x3 Loadport: imprint x2, master mold x1, replica mold x1 |
| Work size | Φ200mm（0.3mm≦t≦1mm） |
| Master mold size/ Replica mold size | Φ200mm（0.3mm≦t≦1mm/ Φ300mm（0.7mm）） |
| UV | UV-LED 365nm |
| Maximum load | ≦0.90MPa |
| Vacuum | ≧50Pa |
| Demolding | Nearly vertical demolding angle |
| Alignment accuracy | ±1μm (optional) |
| Throughput | 20 wfs/hr (on SCIVAX specified process) |
| Dimensions | W5,460ｘＤ2,560ｘＨ2,500（mm） |
RubiQ® Type RD-100/RD-200
There is a growing need from corporate R&D departments, universities and research institutes to purchase nanoimprinting equipment for the purpose of conducting basic research and processing experiments using a variety of materials.
SCIVAX has developed a revolutionary concept that is unprecedented in its ability to handle a wide variety of processes by taking advantage of the strengths of a nano-imprint equipment manufacturer and the process know-how cultivated through a track record of over 1,000 contracts.
Dowload the White paper
Key Features
・Cure method and press method are selectable
Cure method: UV /Thermal /UV＋Thermal assist
Press Method: Parallel Plate / FLAN Air assisted (patented)
・A variety of optional features
HEPA filter unit / Ionizer
Automatic processing (Standard on RD-200)
High intensity UV LED unit (Standard on RD-200)
Precise vacuum control (Standard on RD-200)
The above methods and functions can be changed or added even after the installation (on-site retrofittable).
| Type: | RD-100 | RD-200 |
|---|---|---|
| Cure method: | UV Thermal UV + Thermal assist | UV UV + Thermal assist |
| Press Method: | Parallel Plate FLAN *Air assisted | FLAN *Air assisted |
| Maximum work size: | Φ100mm | Φ200mm |
| Maximum load: | 0.7MPa | 0.7MPa |
| Thermal specifications: | Heating temperature: 200℃ (Both for thermoplastic and thermosetting resin use) | Heating temperature: 100℃ (Only for thermoplastic resin use) |
| UV specifications: | Wavelength: 365nm Illumination: 200mW/cm² 400mW/cm² (optional) | Wavelength: 365nm Illumination: 400mW/cm² |
| Bonding in vacuum: | Yes | Yes |
| Dimensions: | W540ｘＤ790ｘＨ1790（mm） | W700ｘＤ980ｘＨ2100（mm） |
| Weight: | 300㎏ | 500㎏ |
| Notes: | Will be released in April 2026 |
NANOBIC 7-7,
Shinkawasaki,
Saiwai-ku, Kawasaki City,
Kanagawa Prefecture
212-0032