Pillar/Hole Pattern is used in various fields, such as improvement of LED external quantum efficiency, biosensor, metalens, metasurface, etc.
φ100nm, Height 150nm
φ230nm, Height 500nm (Silicon Wafer)
Top Left: φ150nm,
Right: φ100nm,
Bottom Left: φ200nm,
Right: φ250nm
High Aspect Ratio(A/R=5)
Pillar Pattern
φ230nm Hole
φ230nm Hole, Magnified
Lens arrays are being considered for use in a variety of optical devices.
Lens Arrays φ10μm~φ200μm
Lens Arrays φ10μm~φ200μm
Lens Arrays φ10μm~φ200μm
With Moth-Eye structure processing onto lens surfaces, some problems can be solved such as ghost, flare, etc.
Moth-Eye
Moth-Eye Processing onto Lens Curved Surfaces.
Pitch 250nm~180nm
There is ghost image of photographer on the lens.
The image under the lens is clearly seen.
Unprocessed Film
Honeycomb/Lattice Pattern is used for various fields, such as electronic materials, biology, etc.
Width 100nm Honeycomb Pattern
One side: 1μm~several tens of μm
One side: 1μm~several tens of μm
Three Dimensional Cell Culture Plates
NanoCulture Plate
Form a spheroid in the patterned culture
L&S Pattern can be fabricated in several tens of nm, practical application is in progress for various fields, such as polarizing plate for a liquid crystal panel.
Several tens of nm~a few hundreds of μm
Several tens of nm~a few hundreds of μm
Metal Wiring practical application is in progress for various fields, such as touch panel.
Ag Thin Wire Pattern on PET Film
(Linewidths: 50nm~1μm)
Ag Thin Wire Pattern on PET Film
(Linewidths: 50nm~1μm)
NANOBIC 7-7,
Shinkawasaki,
Saiwai-ku, Kawasaki City,
Kanagawa Prefecture
212-0032