A processing technology that directly transfers nanoscale fine patterns onto resins or thin-film substrates via a mold (template). Unlike optical lithography, it is not subject to resolution constraints based on wavelength, enabling the formation of structures of several tens of nm or less. It offers excellent shape reproducibility and is a mass-production technology with lower costs compared to photolithography.

A technology that uses Nanoimprint Lithography (NIL) to uniformly transfer patterns across large substrates, such as large-diameter wafers or mother glass substrates. Equipment includes batch processing systems as well as Roll-to-Roll and Roll-to-Plate systems.

The original template used for pattern transfer in Nanoimprint Lithography (NIL). These are generally formed on Si or quartz using Electron Beam Lithography (EBL) or photolithography combined with dry etching. Depending on the pattern size, cutting or Ni electroforming may also be used. Resin versions created using the step-and-repeat method are sometimes referred to as "resin master molds."

The base material on which fine resin patterns are formed during the nanoimprint process. Various materials such as glass, Si, compound semiconductors, and resin films are utilized.

A resin mold duplicated from a master mold using a specialized replica resin. These are used for molding the imprint substrate to avoid wear or damage to the master mold from direct use. Depending on the pattern and required characteristics, they are typically replaced after several dozen uses.

In the case of UV imprinting, this refers to a resin solution specifically for imprinting that hardens when exposed to UV light (usually i-line). For thermal imprinting, thermoplastic or thermosetting resins are used, available in solution or sheet form.

A treatment performed in advance when creating a replica mold from a master mold to prevent resin adhesion to the master mold surface and improve separation. It is also sometimes applied to the surface of the replica mold.

A dry cleaning and surface activation treatment using VUV light, which may be performed before the primer treatment of the imprint substrate.

A chemical solution that promotes adhesion between the substrate and the molding resin. When applying UV imprinting to glass substrates or similar materials, a surface treatment is performed by pre-coating the substrate surface with a silane coupling agent.

The thin resin film that remains on the molded substrate in areas other than the pattern during the imprint process.

A film formed during the imprint process that functions as an etching mask and is eventually removed, serving only as a temporary structure.

A film formed during the imprint process that remains as the final structure of the device.

The process of peeling the replica mold away from the resin surface after the imprint resin has cured.

The angle of inclination on the sidewall of a fine pattern, from the base (substrate side) toward the top of the pattern. In the imprinting process, a slight taper angle (where the top of the pattern is narrower) makes demolding easier, while an inverse taper makes demolding difficult.

While often used as an abbreviation for Design of Experiments, in the field of NIL, it refers to a Diffractive Optical Element. By configuring fine height structures (such as stepped structures), the phase, amplitude, and intensity distribution of incident light can be controlled arbitrarily. While it can generate complex light distributions, it may also produce a strong light spot known as zero-order light, where part of the incident light passes through without being diffracted.

[Reference] ⇒ Our diffusion optical element (diffuser) that does not generate zero-order light: Platanus