High-precision molding of SRG-type waveguides for AR/MR glasses. We support both diffraction grating formation in high-refractive-index resin and etching of high-refractive-index inorganic materials such as SiC. With low-distortion imprinting using Dyad®, we mass-produce high-yield, high-quality waveguides.
We support both direct molding with high-refractive-index imprint resin and processes that etch high-refractive-index substrates such as SiC. We build materials and processes from the ground up.
The Hard-to-Hard method using our proprietary Dyad® minimizes pattern pitch misalignment between the In-Coupler and Out-Coupler, enabling high-precision molding while suppressing image quality degradation.
Low-distortion imprinting greatly improves waveguide yield without being affected by pupil size or FOV. Yield improvement in mass production directly contributes to cost reduction.
We support molding of high-refractive-index imprint resin onto transparent glass substrates with n=2.0 or higher, stably forming diffraction gratings in a variety of shapes.
Foundry services are currently available up to phi 8″. Dyad® systems are also sold in 8″ and 12″ formats, preparing for future large-diameter requirements.
In addition to foundry services, we also sell Dyad® systems. For customers considering in-house production, we provide integrated support for both equipment and processes.
Compared with conventional NIL methods, Dyad®’s Hard-to-Hard method reduces pattern pitch misalignment between the In-Coupler and Out-Coupler. It suppresses the impact of pupil size and FOV variation on yield, enabling high-precision AR waveguides to be produced at high yield.
High-n resin imprint on high-n substrate
SRG-type diffraction gratings are formed on a high-refractive-index transparent substrate (glass n=2.0 or higher) using high-refractive-index imprint resin.
Substrate etching (e.g. SiC)
Diffraction gratings are formed by etching high-refractive-index substrates themselves, such as SiC and TiO2. Using imprint resin dedicated to etching, direct patterning onto inorganic films such as substrates is achieved.
| Item | Specifications / Supported Range |
|---|---|
| Supported Types | High-refractive-index resin molding (Type A) / high-refractive-index substrate etching (Type B) |
| Substrate Refractive Index | Supports high-refractive-index transparent substrates with n = 2.0 or higher |
| Imprint Method | Hard-to-Hard low-distortion imprinting with Dyad® |
| Supported Wafer Sizes | Up to phi 8″ (foundry) / phi 8″ and phi 12″ (Dyad® system sales) |
| Pattern Types | SRG-type diffraction gratings (In-Coupler / Out-Coupler) |
| Features | Minimized pattern pitch misalignment and high yield through low distortion |
A yield improvement example for Dyad® molding compared with a conventional NIL method. The impact of pupil size and FOV variation on waveguide yield is minimized.
SEM cross-sectional image of a diffraction grating pattern molded for AR waveguides. High-precision reproducibility of the grating shape was confirmed.
We will propose a solution tailored to your specifications and production scale. Please feel free to contact us.
