Compound Semiconductors | Foundry Services | SCIVAX<\/title>\n<style>\n * { box-sizing: border-box; margin: 0; padding: 0; }\n body { font-family: sans-serif; background: #F4F6F9; color: #1a1a1a; line-height: 1.6; }\n\n \/* \u2500\u2500 \u30bf\u30d6\u30ca\u30d3 sticky \u30e9\u30c3\u30d1 \u2500\u2500 *\/\n .tab-nav-sticky {\n width: 100vw;\n margin-left: calc(-50vw + 50%);\n }\n .tab-nav-sticky.is-fixed {\n position: fixed !important;\n top: 80px !important;\n left: 0 !important;\n width: 100vw !important;\n margin-left: 0 !important;\n z-index: 99999 !important;\n box-shadow: inset 0 1px 0 0 #e5e5e5 !important;\n }\n @media (max-width: 1024px) {\n .tab-nav-sticky.is-fixed { top: 60px !important; }\n }\n\n \/* \u2500\u2500 \u4e0a\u90e8\u30ca\u30d3\uff08\u6a2a\u30b9\u30af\u30ed\u30fc\u30eb\u3042\u308a\u30fb\u5168\u5e45\uff09 \u2500\u2500 *\/\n .app-nav {\n width: 100%;\n background: #fff;\n border-bottom: 1px solid #e5e5e5;\n overflow-x: auto;\n -webkit-overflow-scrolling: touch;\n }\n .app-nav-inner { max-width: 1100px; 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border: 1px solid #e5e5e5; border-radius: 10px; position: relative; }\n .process-card.scivax { border-color: #1D9E75; border-width: 2px; }\n .process-img { width: 100%; aspect-ratio: 4 \/ 3; background: #E1F5EE; overflow: hidden; border-radius: 9px 9px 0 0; }\n .process-img img { width: 100%; height: 100%; object-fit: cover; display: block; }\n .process-img-placeholder { width: 100%; height: 100%; display: flex; align-items: center; justify-content: center; background: #E1F5EE; color: #5DCAA5; font-size: 22px; }\n .process-card.scivax .process-img-placeholder { background: #C5EEE0; }\n .process-body { padding: 0.875rem 1rem; }\n .process-step-label { font-size: 11px; font-weight: 700; letter-spacing: 0.1em; color: #aaa; text-transform: uppercase; margin-bottom: 4px; display: flex; align-items: center; gap: 6px; }\n .process-card.scivax .process-step-label { color: #1D9E75; }\n .scivax-badge { background: #1D9E75; color: #fff; font-size: 10px; font-weight: 700; padding: 2px 6px; border-radius: 3px; 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height: 100%; object-fit: cover; display: block; }\n .case-img-placeholder { width: 100%; height: 100%; display: flex; align-items: center; justify-content: center; background: #E1F5EE; color: #5DCAA5; font-size: 24px; }\n .case-card h4 { font-size: 18px; font-weight: 600; color: #111; margin-bottom: 6px; }\n .case-card p { font-size: 16px; color: #666; line-height: 1.65; }\n .divider { border: none; border-top: 1px solid #e5e5e5; margin: 2.5rem 0; }\n\n \/* \u2500\u2500 CTA \u2500\u2500 *\/\n .cta-bar { background: #f7f7f7; border: 1px solid #e5e5e5; border-radius: 10px; padding: 1.5rem 1.75rem; display: flex; align-items: center; justify-content: space-between; gap: 1rem; }\n .cta-text h3 { font-size: 19px; font-weight: 600; color: #111; margin-bottom: 4px; }\n .cta-text p { font-size: 16px; color: #555; }\n .cta-btn { background: #1D9E75; color: #fff !important; border: none; border-radius: 7px; padding: 0.7rem 1.6rem; font-size: 15px; font-weight: 600; cursor: pointer; white-space: nowrap; display: inline-flex; align-items: center; gap: 7px; text-decoration: none; transition: background 0.15s; }\n .cta-btn:hover { background: #0F6E56; }\n\n \/* \u2500\u2500 \u30ec\u30b9\u30dd\u30f3\u30b7\u30d6 \u2500\u2500 *\/\n @media (max-width: 700px) {\n .hero-inner { grid-template-columns: 1fr; }\n .hero-img-wrap { order: -1; }\n .points-grid { grid-template-columns: 1fr; }\n .process-grid { grid-template-columns: 1fr 1fr; }\n .cases-grid { grid-template-columns: 1fr; }\n .cta-bar { flex-direction: column; align-items: flex-start; }\n .app-nav-inner { padding: 0 16px; }\n }\n <\/style>\n<\/head>\n<body>\n<div class=\"tab-nav-sticky\" id=\"tab-nav-sticky\">\n<div class=\"app-nav\">\n<div class=\"app-nav-inner\">\n<a class=\"app-nav-back\" href=\"\/en\/foundry\/\">\u2190 Foundry Services<\/a>\n<a class=\"app-nav-item\" href=\"\/en\/foundry\/npo-cpo\/\">Photonic-Electronic Integration<\/a>\n<a class=\"app-nav-item\" href=\"\/en\/foundry\/metalens\/\">Metalens<\/a>\n<a class=\"app-nav-item active\" href=\"\/en\/foundry\/compound-semiconductor\/\">Compound Semiconductors<\/a>\n<a class=\"app-nav-item\" href=\"\/en\/foundry\/bio-device\/\">Bio Devices<\/a>\n<a class=\"app-nav-item\" href=\"\/en\/foundry\/ar-waveguide\/\">AR Waveguides<\/a>\n<\/div>\n<\/div>\n<\/div>\n<div class=\"hero\">\n<div class=\"hero-inner\">\n<div>\n<div class=\"hero-label\">Foundry Application<\/div>\n<h1 class=\"hero-title\">Compound Semiconductors<\/h1>\n<p class=\"hero-desc\">High-precision grating formation on compound semiconductor substrates such as GaAs and InP. We support lambda\/4 phase shifts and wavelength tuning for DFB lasers, enabling high-throughput mass production.<\/p>\n<\/div>\n<div class=\"hero-img-wrap\">\n<img decoding=\"async\" alt=\"Compound semiconductor grating\" src=\"\/wp-content\/uploads\/2026\/05\/Image-2026\u5e745\u670822\u65e5-23_54_09.png\"\/>\n<div class=\"hero-img-placeholder\">Image placeholder<\/div>\n<\/div>\n<\/div>\n<\/div>\n<div class=\"page-wrap\">\n<div class=\"section-heading\">\n<div class=\"section-heading-bar\"><\/div>\n<span class=\"section-heading-text\">Why Choose SCIVAX<\/span>\n<\/div>\n<div class=\"points-grid\">\n<div class=\"point-card\">\n<div class=\"point-num\">01<\/div>\n<div class=\"point-body\">\n<h4>Sub-nm-Level Pitch Control<\/h4>\n<p>Pattern pitch is controlled at the sub-nanometer level, enabling stable formation of high-precision gratings on compound semiconductor substrates for mass production.<\/p>\n<\/div>\n<\/div>\n<div class=\"point-card\">\n<div class=\"point-num\">02<\/div>\n<div class=\"point-body\">\n<h4>Support for Lambda Shift and Chirped Gratings<\/h4>\n<p>We support lambda\/4 phase-shift gratings and chirped gratings (pitch-modulated gratings). By incorporating design information into the master mold, complex optical structures can be mass-produced with high precision and repeatability.<\/p>\n<\/div>\n<\/div>\n<div class=\"point-card\">\n<div class=\"point-num\">03<\/div>\n<div class=\"point-body\">\n<h4>\u00b11 \u03bcm-Level Alignment<\/h4>\n<p>Alignment accuracy of \u00b11 um is possible.<\/p>\n<\/div>\n<\/div>\n<div class=\"point-card\">\n<div class=\"point-num\">04<\/div>\n<div class=\"point-body\">\n<h4>Support for phi 2\u2033 to phi 8\u2033 Substrates<\/h4>\n<p>Mass production is supported for compound semiconductor substrates such as InP and GaAs from phi 2\u2033 to phi 8\u2033.<\/p>\n<\/div>\n<\/div>\n<div class=\"point-card\">\n<div class=\"point-num\">05<\/div>\n<div class=\"point-body\">\n<h4>Contract Processing from 10 to 1,000 Wafers\/Month<\/h4>\n<p>We flexibly support everything from small-lot prototyping to mass production at the 1,000 wafers\/month level, with integrated support for production launch.<\/p>\n<\/div>\n<\/div>\n<\/div>\n<div class=\"specs-section\">\n<div class=\"section-heading\">\n<div class=\"section-heading-bar\"><\/div>\n<span class=\"section-heading-text\">Specifications<\/span>\n<\/div>\n<div class=\"s_table\"><table class=\"specs-table\">\n<thead><tr><th>Item<\/th><th>Specifications \/ Supported Range<\/th><\/tr><\/thead>\n<tbody>\n<tr><td>Supported Substrate Materials<\/td><td>InP, GaAs, and other compound semiconductors<\/td><\/tr>\n<tr><td>Substrate Size<\/td><td>\u03c62\u2033 \u2013 \u03c68\u2033<\/td><\/tr>\n<tr><td>Pitch Accuracy<\/td><td>Sub-nm-level control<\/td><\/tr>\n<tr><td>Grating Structures<\/td><td>Uniform gratings, lambda\/4 phase shift, chirped gratings<\/td><\/tr>\n<tr><td>Alignment Accuracy<\/td><td>\u00b11 \u03bcm level<\/td><\/tr>\n<tr><td>Production Scale<\/td><td>10 to 1,000 wafers\/month (up to 50 wafers\/day)<\/td><\/tr>\n<tr><td>Lead Time (Prototype)<\/td><td>Test pattern fabrication: about 2 months plus evaluation \/ mold fabrication: 1 to 1.5 months<\/td><\/tr>\n<\/tbody>\n<\/table><\/div>\n<\/div>\n<div class=\"process-section\">\n<div class=\"section-heading\">\n<div class=\"section-heading-bar\"><\/div>\n<span class=\"section-heading-text\">Process Flow<\/span>\n<\/div>\n<div class=\"process-grid\">\n<div class=\"process-card\">\n<div class=\"process-img\">\n<img decoding=\"async\" alt=\"Epitaxial Growth and HM Film Deposition\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-22-23.52.40.png\" style=\"transform: scale(1.05);\"\/>\n<\/div>\n<div class=\"process-body\">\n<div class=\"process-step-label\">Step 1 \u2014 Customer<\/div>\n<div class=\"process-step-name\">Epitaxial Growth and HM Film Deposition<\/div>\n<div class=\"process-step-desc\">Epitaxial growth and SiO2\/SiN hard mask deposition on a compound semiconductor substrate<\/div>\n<\/div>\n<div class=\"process-arrow\">\u203a<\/div>\n<\/div>\n<div class=\"process-card scivax\">\n<div class=\"process-img\">\n<img decoding=\"async\" alt=\"Nanoimprint\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-22-23.52.59.png\"\/>\n<\/div>\n<div class=\"process-body\">\n<div class=\"process-step-label\">Step 2 \u2014 <span class=\"scivax-badge\">SCIVAX<\/span><\/div>\n<div class=\"process-step-name\">Nanoimprint<\/div>\n<div class=\"process-step-desc\">Nanoimprint the grating pattern<\/div>\n<\/div>\n<div class=\"process-arrow\">\u203a<\/div>\n<\/div>\n<div class=\"process-card\">\n<div class=\"process-img\">\n<img decoding=\"async\" alt=\"Residual Layer and HM Etching\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-22-23.53.09.png\"\/>\n<\/div>\n<div class=\"process-body\">\n<div class=\"process-step-label\">Step 3 \u2014 Customer<\/div>\n<div class=\"process-step-name\">Residual Layer and HM Etching<\/div>\n<div class=\"process-step-desc\">Pattern the residual layer and hard mask by dry etching<\/div>\n<\/div>\n<div class=\"process-arrow\">\u203a<\/div>\n<\/div>\n<div class=\"process-card\">\n<div class=\"process-img\">\n<img decoding=\"async\" alt=\"Grating Etching and Removal\" src=\"\/wp-content\/uploads\/2026\/06\/1.png\"\/>\n<\/div>\n<div class=\"process-body\">\n<div class=\"process-step-label\">Step 4 \u2014 Customer<\/div>\n<div class=\"process-step-name\">Grating Etching and Removal<\/div>\n<div class=\"process-step-desc\">After dry\/wet etching the grating layer, remove the NIL layer and HM<\/div>\n<\/div>\n<\/div>\n<\/div>\n<\/div>\n<div class=\"cases-section\">\n<div class=\"section-heading\">\n<div class=\"section-heading-bar\"><\/div>\n<span class=\"section-heading-text\">Molding Examples<\/span>\n<\/div>\n<div class=\"cases-grid\">\n<div class=\"case-card\">\n<div class=\"case-img\">\n<img decoding=\"async\" alt=\"3-inch InP wafer DFB grating\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-23-0.51.23.png\"\/>\n<\/div>\n<h4>DFB Grating Formation on a 3-Inch InP Wafer<\/h4>\n<p>A 200 nm pitch grating is uniformly formed across the entire 3-inch InP wafer, achieving oscillation wavelength variation within \u00b10.1 nm.<\/p>\n<\/div>\n<div class=\"case-card\">\n<div class=\"case-img\">\n<img decoding=\"async\" alt=\"12-inch Si wafer 50 nm L\/S\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-23-0.42.08.png\"\/>\n<\/div>\n<h4>Half-Pitch 50 nm L\/S (12-Inch Si Wafer)<\/h4>\n<p>Half-pitch 50 nm L\/S on a 12-inch Si wafer<\/p>\n<\/div>\n<div class=\"case-card\">\n<div class=\"case-img\">\n<img decoding=\"async\" alt=\"Molding example 3\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-23-0.35.21.png\"\/>\n<\/div>\n<h4>Molding Examples<\/h4>\n<p>lambda\/4 Phase-Shift Structure<\/p>\n<\/div>\n<div class=\"case-card\">\n<div class=\"case-img\">\n<img decoding=\"async\" alt=\"Molding example 4\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-23-0.23.57.png\"\/>\n<\/div>\n<h4>Molding Examples<\/h4>\n<p>Residual layer <30 nm<\/p>\n<\/div>\n<\/div>\n<\/div>\n<hr class=\"divider\"\/>\n<div class=\"cta-bar\">\n<div class=\"cta-text\">\n<h3>Foundry Consultation for Compound Semiconductors<\/h3>\n<p>We will propose a solution tailored to your specifications and production scale. Please feel free to contact us.<\/p>\n<\/div>\n<a class=\"cta-btn\" href=\"\/en\/contact\/\">Contact Us<\/a>\n<\/div>\n<\/div>\n<script>\ndocument.addEventListener('DOMContentLoaded', function () {\n\n \/* Simulate active state for the global Foundry Services menu item *\/\n (function () {\n var PARENT_PATH = '\/foundry'; \/\/ Compare without a trailing slash\n var menuRoot = document.getElementById('header') || document.querySelector('header');\n if (!menuRoot) return;\n\n function normPath(p) { return p.replace(\/\\\/+$\/, '') || '\/'; }\n\n \/\/ Detect the classes attached to the current active page item\n var activeClasses = [];\n var activeLi = menuRoot.querySelector(\n 'li.current-menu-item, li.current_page_item, li.current-menu-parent, li.current-menu-ancestor, li.current_page_parent'\n );\n if (activeLi) {\n activeClasses = Array.prototype.slice.call(activeLi.classList).filter(function (c) {\n return c.indexOf('current') !== -1;\n });\n }\n if (activeClasses.length === 0) 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\n\t\t\t\t\t\n\n\n\n\n\nCompound Semiconductors | Foundry Services | SCIVAX<\/title>\n<style>\n * { box-sizing: border-box; margin: 0; padding: 0; }\n body { font-family: sans-serif; background: #F4F6F9; color: #1a1a1a; line-height: 1.6; }\n\n \/* \u2500\u2500 \u30bf\u30d6\u30ca\u30d3 sticky \u30e9\u30c3\u30d1 \u2500\u2500 *\/\n .tab-nav-sticky {\n width: 100vw;\n margin-left: calc(-50vw + 50%);\n }\n .tab-nav-sticky.is-fixed {\n position: fixed !important;\n top: 80px !important;\n left: 0 !important;\n width: 100vw !important;\n margin-left: 0 !important;\n z-index: 99999 !important;\n box-shadow: inset 0 1px 0 0 #e5e5e5 !important;\n }\n @media (max-width: 1024px) {\n .tab-nav-sticky.is-fixed { top: 60px !important; }\n }\n\n \/* \u2500\u2500 \u4e0a\u90e8\u30ca\u30d3\uff08\u6a2a\u30b9\u30af\u30ed\u30fc\u30eb\u3042\u308a\u30fb\u5168\u5e45\uff09 \u2500\u2500 *\/\n .app-nav {\n width: 100%;\n background: #fff;\n border-bottom: 1px solid #e5e5e5;\n overflow-x: auto;\n -webkit-overflow-scrolling: touch;\n }\n .app-nav-inner { max-width: 1100px; 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flex-shrink: 0; }\n .point-body h4 { font-size: 18px; font-weight: 600; color: #111; margin-bottom: 5px; }\n .point-body p { font-size: 16px; color: #555; line-height: 1.7; }\n .specs-section { margin-bottom: 3rem; }\n .specs-table { width: 100%; border-collapse: collapse; background: #fff; border-radius: 10px; overflow: hidden; border: 1px solid #e5e5e5; font-size: 16px; }\n .specs-table th { background: #04342C; color: rgba(255,255,255,0.7); font-size: 13px; font-weight: 600; letter-spacing: 0.08em; text-transform: uppercase; padding: 12px 20px; text-align: left; }\n .specs-table td { padding: 13px 20px; border-bottom: 1px solid #f0f0f0; color: #333; vertical-align: top; }\n .specs-table tr:last-child td { border-bottom: none; }\n .specs-table td:first-child { font-weight: 500; color: #555; width: 38%; }\n\n \/* \u2500\u2500 Process flow \u2500\u2500 *\/\n .process-section { margin-bottom: 3rem; }\n .process-grid { display: grid; grid-template-columns: repeat(4, 1fr); gap: 12px; }\n .process-card { background: #fff; 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height: 100%; object-fit: cover; display: block; }\n .case-img-placeholder { width: 100%; height: 100%; display: flex; align-items: center; justify-content: center; background: #E1F5EE; color: #5DCAA5; font-size: 24px; }\n .case-card h4 { font-size: 18px; font-weight: 600; color: #111; margin-bottom: 6px; }\n .case-card p { font-size: 16px; color: #666; line-height: 1.65; }\n .divider { border: none; border-top: 1px solid #e5e5e5; margin: 2.5rem 0; }\n\n \/* \u2500\u2500 CTA \u2500\u2500 *\/\n .cta-bar { background: #f7f7f7; border: 1px solid #e5e5e5; border-radius: 10px; padding: 1.5rem 1.75rem; display: flex; align-items: center; justify-content: space-between; gap: 1rem; }\n .cta-text h3 { font-size: 19px; font-weight: 600; color: #111; margin-bottom: 4px; }\n .cta-text p { font-size: 16px; color: #555; }\n .cta-btn { background: #1D9E75; color: #fff !important; border: none; border-radius: 7px; padding: 0.7rem 1.6rem; font-size: 15px; font-weight: 600; cursor: pointer; white-space: nowrap; display: inline-flex; align-items: center; gap: 7px; text-decoration: none; transition: background 0.15s; }\n .cta-btn:hover { background: #0F6E56; }\n\n \/* \u2500\u2500 \u30ec\u30b9\u30dd\u30f3\u30b7\u30d6 \u2500\u2500 *\/\n @media (max-width: 700px) {\n .hero-inner { grid-template-columns: 1fr; }\n .hero-img-wrap { order: -1; }\n .points-grid { grid-template-columns: 1fr; }\n .process-grid { grid-template-columns: 1fr 1fr; }\n .cases-grid { grid-template-columns: 1fr; }\n .cta-bar { flex-direction: column; align-items: flex-start; }\n .app-nav-inner { padding: 0 16px; }\n }\n <\/style>\n<\/head>\n<body>\n<div class=\"tab-nav-sticky\" id=\"tab-nav-sticky\">\n<div class=\"app-nav\">\n<div class=\"app-nav-inner\">\n<a class=\"app-nav-back\" href=\"\/en\/foundry\/\">\u2190 Foundry Services<\/a>\n<a class=\"app-nav-item\" href=\"\/en\/foundry\/npo-cpo\/\">Photonic-Electronic Integration<\/a>\n<a class=\"app-nav-item\" href=\"\/en\/foundry\/metalens\/\">Metalens<\/a>\n<a class=\"app-nav-item active\" href=\"\/en\/foundry\/compound-semiconductor\/\">Compound Semiconductors<\/a>\n<a class=\"app-nav-item\" href=\"\/en\/foundry\/bio-device\/\">Bio Devices<\/a>\n<a class=\"app-nav-item\" href=\"\/en\/foundry\/ar-waveguide\/\">AR Waveguides<\/a>\n<\/div>\n<\/div>\n<\/div>\n<div class=\"hero\">\n<div class=\"hero-inner\">\n<div>\n<div class=\"hero-label\">Foundry Application<\/div>\n<h1 class=\"hero-title\">Compound Semiconductors<\/h1>\n<p class=\"hero-desc\">High-precision grating formation on compound semiconductor substrates such as GaAs and InP. We support lambda\/4 phase shifts and wavelength tuning for DFB lasers, enabling high-throughput mass production.<\/p>\n<\/div>\n<div class=\"hero-img-wrap\">\n<img decoding=\"async\" alt=\"Compound semiconductor grating\" src=\"\/wp-content\/uploads\/2026\/05\/Image-2026\u5e745\u670822\u65e5-23_54_09.png\"\/>\n<div class=\"hero-img-placeholder\">Image placeholder<\/div>\n<\/div>\n<\/div>\n<\/div>\n<div class=\"page-wrap\">\n<div class=\"section-heading\">\n<div class=\"section-heading-bar\"><\/div>\n<span class=\"section-heading-text\">Why Choose SCIVAX<\/span>\n<\/div>\n<div class=\"points-grid\">\n<div class=\"point-card\">\n<div class=\"point-num\">01<\/div>\n<div class=\"point-body\">\n<h4>Sub-nm-Level Pitch Control<\/h4>\n<p>Pattern pitch is controlled at the sub-nanometer level, enabling stable formation of high-precision gratings on compound semiconductor substrates for mass production.<\/p>\n<\/div>\n<\/div>\n<div class=\"point-card\">\n<div class=\"point-num\">02<\/div>\n<div class=\"point-body\">\n<h4>Support for Lambda Shift and Chirped Gratings<\/h4>\n<p>We support lambda\/4 phase-shift gratings and chirped gratings (pitch-modulated gratings). By incorporating design information into the master mold, complex optical structures can be mass-produced with high precision and repeatability.<\/p>\n<\/div>\n<\/div>\n<div class=\"point-card\">\n<div class=\"point-num\">03<\/div>\n<div class=\"point-body\">\n<h4>\u00b11 \u03bcm-Level Alignment<\/h4>\n<p>Alignment accuracy of \u00b11 um is possible.<\/p>\n<\/div>\n<\/div>\n<div class=\"point-card\">\n<div class=\"point-num\">04<\/div>\n<div class=\"point-body\">\n<h4>Support for phi 2\u2033 to phi 8\u2033 Substrates<\/h4>\n<p>Mass production is supported for compound semiconductor substrates such as InP and GaAs from phi 2\u2033 to phi 8\u2033.<\/p>\n<\/div>\n<\/div>\n<div class=\"point-card\">\n<div class=\"point-num\">05<\/div>\n<div class=\"point-body\">\n<h4>Contract Processing from 10 to 1,000 Wafers\/Month<\/h4>\n<p>We flexibly support everything from small-lot prototyping to mass production at the 1,000 wafers\/month level, with integrated support for production launch.<\/p>\n<\/div>\n<\/div>\n<\/div>\n<div class=\"specs-section\">\n<div class=\"section-heading\">\n<div class=\"section-heading-bar\"><\/div>\n<span class=\"section-heading-text\">Specifications<\/span>\n<\/div>\n<div class=\"s_table\"><table class=\"specs-table\">\n<thead><tr><th>Item<\/th><th>Specifications \/ Supported Range<\/th><\/tr><\/thead>\n<tbody>\n<tr><td>Supported Substrate Materials<\/td><td>InP, GaAs, and other compound semiconductors<\/td><\/tr>\n<tr><td>Substrate Size<\/td><td>\u03c62\u2033 \u2013 \u03c68\u2033<\/td><\/tr>\n<tr><td>Pitch Accuracy<\/td><td>Sub-nm-level control<\/td><\/tr>\n<tr><td>Grating Structures<\/td><td>Uniform gratings, lambda\/4 phase shift, chirped gratings<\/td><\/tr>\n<tr><td>Alignment Accuracy<\/td><td>\u00b11 \u03bcm level<\/td><\/tr>\n<tr><td>Production Scale<\/td><td>10 to 1,000 wafers\/month (up to 50 wafers\/day)<\/td><\/tr>\n<tr><td>Lead Time (Prototype)<\/td><td>Test pattern fabrication: about 2 months plus evaluation \/ mold fabrication: 1 to 1.5 months<\/td><\/tr>\n<\/tbody>\n<\/table><\/div>\n<\/div>\n<div class=\"process-section\">\n<div class=\"section-heading\">\n<div class=\"section-heading-bar\"><\/div>\n<span class=\"section-heading-text\">Process Flow<\/span>\n<\/div>\n<div class=\"process-grid\">\n<div class=\"process-card\">\n<div class=\"process-img\">\n<img decoding=\"async\" alt=\"Epitaxial Growth and HM Film Deposition\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-22-23.52.40.png\" style=\"transform: scale(1.05);\"\/>\n<\/div>\n<div class=\"process-body\">\n<div class=\"process-step-label\">Step 1 \u2014 Customer<\/div>\n<div class=\"process-step-name\">Epitaxial Growth and HM Film Deposition<\/div>\n<div class=\"process-step-desc\">Epitaxial growth and SiO2\/SiN hard mask deposition on a compound semiconductor substrate<\/div>\n<\/div>\n<div class=\"process-arrow\">\u203a<\/div>\n<\/div>\n<div class=\"process-card scivax\">\n<div class=\"process-img\">\n<img decoding=\"async\" alt=\"Nanoimprint\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-22-23.52.59.png\"\/>\n<\/div>\n<div class=\"process-body\">\n<div class=\"process-step-label\">Step 2 \u2014 <span class=\"scivax-badge\">SCIVAX<\/span><\/div>\n<div class=\"process-step-name\">Nanoimprint<\/div>\n<div class=\"process-step-desc\">Nanoimprint the grating pattern<\/div>\n<\/div>\n<div class=\"process-arrow\">\u203a<\/div>\n<\/div>\n<div class=\"process-card\">\n<div class=\"process-img\">\n<img decoding=\"async\" alt=\"Residual Layer and HM Etching\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-22-23.53.09.png\"\/>\n<\/div>\n<div class=\"process-body\">\n<div class=\"process-step-label\">Step 3 \u2014 Customer<\/div>\n<div class=\"process-step-name\">Residual Layer and HM Etching<\/div>\n<div class=\"process-step-desc\">Pattern the residual layer and hard mask by dry etching<\/div>\n<\/div>\n<div class=\"process-arrow\">\u203a<\/div>\n<\/div>\n<div class=\"process-card\">\n<div class=\"process-img\">\n<img decoding=\"async\" alt=\"Grating Etching and Removal\" src=\"\/wp-content\/uploads\/2026\/06\/1.png\"\/>\n<\/div>\n<div class=\"process-body\">\n<div class=\"process-step-label\">Step 4 \u2014 Customer<\/div>\n<div class=\"process-step-name\">Grating Etching and Removal<\/div>\n<div class=\"process-step-desc\">After dry\/wet etching the grating layer, remove the NIL layer and HM<\/div>\n<\/div>\n<\/div>\n<\/div>\n<\/div>\n<div class=\"cases-section\">\n<div class=\"section-heading\">\n<div class=\"section-heading-bar\"><\/div>\n<span class=\"section-heading-text\">Molding Examples<\/span>\n<\/div>\n<div class=\"cases-grid\">\n<div class=\"case-card\">\n<div class=\"case-img\">\n<img decoding=\"async\" alt=\"3-inch InP wafer DFB grating\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-23-0.51.23.png\"\/>\n<\/div>\n<h4>DFB Grating Formation on a 3-Inch InP Wafer<\/h4>\n<p>A 200 nm pitch grating is uniformly formed across the entire 3-inch InP wafer, achieving oscillation wavelength variation within \u00b10.1 nm.<\/p>\n<\/div>\n<div class=\"case-card\">\n<div class=\"case-img\">\n<img decoding=\"async\" alt=\"12-inch Si wafer 50 nm L\/S\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-23-0.42.08.png\"\/>\n<\/div>\n<h4>Half-Pitch 50 nm L\/S (12-Inch Si Wafer)<\/h4>\n<p>Half-pitch 50 nm L\/S on a 12-inch Si wafer<\/p>\n<\/div>\n<div class=\"case-card\">\n<div class=\"case-img\">\n<img decoding=\"async\" alt=\"Molding example 3\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-23-0.35.21.png\"\/>\n<\/div>\n<h4>Molding Examples<\/h4>\n<p>lambda\/4 Phase-Shift Structure<\/p>\n<\/div>\n<div class=\"case-card\">\n<div class=\"case-img\">\n<img decoding=\"async\" alt=\"Molding example 4\" src=\"\/wp-content\/uploads\/2026\/05\/\u30b9\u30af\u30ea\u30fc\u30f3\u30b7\u30e7\u30c3\u30c8-2026-05-23-0.23.57.png\"\/>\n<\/div>\n<h4>Molding Examples<\/h4>\n<p>Residual layer <30 nm<\/p>\n<\/div>\n<\/div>\n<\/div>\n<hr class=\"divider\"\/>\n<div class=\"cta-bar\">\n<div class=\"cta-text\">\n<h3>Foundry Consultation for Compound Semiconductors<\/h3>\n<p>We will propose a solution tailored to your specifications and production scale. Please feel free to contact us.<\/p>\n<\/div>\n<a class=\"cta-btn\" href=\"\/en\/contact\/\">Contact Us<\/a>\n<\/div>\n<\/div>\n<script>\ndocument.addEventListener('DOMContentLoaded', function () {\n\n \/* Simulate active state for the global Foundry Services menu item *\/\n (function () {\n var PARENT_PATH = '\/foundry'; \/\/ Compare without a trailing slash\n var menuRoot = document.getElementById('header') || document.querySelector('header');\n if (!menuRoot) return;\n\n function normPath(p) { return p.replace(\/\\\/+$\/, '') || '\/'; }\n\n \/\/ Detect the classes attached to the current active page item\n var activeClasses = [];\n var activeLi = menuRoot.querySelector(\n 'li.current-menu-item, li.current_page_item, li.current-menu-parent, li.current-menu-ancestor, li.current_page_parent'\n );\n if (activeLi) {\n activeClasses = Array.prototype.slice.call(activeLi.classList).filter(function (c) {\n return c.indexOf('current') !== -1;\n });\n }\n if (activeClasses.length === 0) 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update();\n});\n<\/script>\n<\/body>\n<\/html>\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"\u5316\u5408\u7269\u534a\u5c0e\u4f53 | \u30d5\u30a1\u30a6\u30f3\u30c9\u30ea\u30b5\u30fc\u30d3\u30b9 | SCIVAX \u2190 \u91cf\u7523\u53d7\u8a17 \u5149\u96fb\u878d\u5408\u7d20\u5b50 \u30e1\u30bf\u30ec\u30f3\u30ba \u5316\u5408\u7269\u534a\u5c0e\u4f53 \u30d0\u30a4\u30aa\u30c7\u30d0\u30a4\u30b9 AR\u7528\u30a6\u30a7\u30fc\u30d6\u30ac\u30a4\u30c9 Foundry Application \u5316\u5408\u7269\u534a\u5c0e\u4f53 GaAs\u30fbInP\u306a\u3069\u306e\u5316\u5408\u7269\u534a\u5c0e\u4f53\u57fa\u677f\u3078\u306e\u9ad8\u7cbe\u5ea6\u30b0\u30ec\u30fc\u30c6\u30a3\u30f3\u30b0\u5f62\u6210\u3002DFB\u30ec\u30fc\u30b6\u5411\u3051\u306e\u03bb\/4\u4f4d\u76f8\u30b7\u30d5\u30c8\u3084\u6ce2\u9577\u30c1\u30e5\u30fc\u30cb\u30f3\u30b0\u306b\u5bfe\u5fdc\u3057\u3001\u9ad8\u30b9\u30eb\u30fc\u30d7\u30c3\u30c8\u306a\u91cf\u7523\u3092\u5b9f\u73fe\u3057\u307e\u3059\u3002 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