Extensive Experience with Over 1000 Contracted Projects
Equipment for Manufacturing a Wide Array of Devices
A One-Stop Solution for the Materialization of Mass Production and Processing Systems
Feature of SCIVAX's Nanoimprint Technology
"Nanoimprint onto large area" open up the future of super nanofabrication technology
With our originally developed Large Area Nanoimprint Technology, the cost for processing can be drastically reduced, so it is sp reading to various applications now.
“For large area glass: single-shot fabrication on G5 (1,100mmX1,300mm)” and “For wafer fabrication: high throughput at most φ8 inches” can be done.
Nanoimprint Foundry Service
(Volume Production Service)
Only with Nanoimprint Technology, a volume production can’t be realized. We make an effort for the fusion technology which is required for practical application, then we have constructed our original Foundry Platform for nanoscale patterning. Using our Foundry Service, you can drastically shorten your development time for new products.
The global alignment accuracy across wafer (φ8” ) is ±3μm.
Pattern transfer with
For L&S with 100nm pitch, we can fabricate a pattern with precision less than 0.1nm.
Some examples of our processing technology
Patterning onto sapphire substrates or compound semiconductors
Uniform patterning onto substrates with some warpage or non-flatness can be done.
Patterning onto lens curved surfaces
Molding onto lens surfaces (concave, convex, and both) can be done.
Patterning onto resin
We have many patterning experiences onto resin film/substrate.
Patterning onto large-area glass substrates
Uniform patterning at most G5 (1,100mmX1,300mm) substrate
can be done.
Glass substrate: Offered by Tokyo Electron、Ltd.
Resin composition for imprint: Made in Toyo Gosei Co., Ltd.