With our originally developed Large Area Nanoimprint Technology, the cost for processing can be drastically reduced, so it is sp reading to various applications now.
“For large area glass: single-shot fabrication on G5 (1,100mmX1,300mm)” and “For wafer fabrication: high throughput at most φ8 inches” can be done.
Only with Nanoimprint Technology, a volume production can’t be realized. We make an effort for the fusion technology which is required for practical application, then we have constructed our original Foundry Platform for nanoscale patterning. Using our Foundry Service, you can drastically shorten your development time for new products.
The global alignment accuracy across wafer (φ8” ) is ±3μm.
For L&S with 100nm pitch, we can fabricate a pattern with precision less than 0.1nm.
Uniform patterning onto substrates with some warpage or non-flatness can be done.
Molding onto lens surfaces (concave, convex, and both) can be done.
We have many patterning experiences onto resin film/substrate.
Uniform patterning at most G5 (1,100mmX1,300mm) substrate
can be done.
Glass substrate: Offered by Tokyo Electron、Ltd.
Resin composition for imprint: Made in Toyo Gosei Co., Ltd.
NANOBIC 7-7, Shinkawasaki,
Saitama-ku, Kawasaki City,
Kanagawa Prefecture 212-0032