Nanoimprint based integrated solutions｜ Nano-patterning technology｜Foundry｜Custom Molds｜SCIVAX
Simulation of NIL patterns for optimizing LED external quantum efficiency
From 20nm Line and Space patterns up to Lens Arrays with elements up to a few hundred microns, a wide variety of NIL molds can be fabricated.
Deposition of SiO2, SiN, metal and other films is possible.
Large area substrate (G5 Panel: 1,100X1,300mm) NIL is possible.
Etch profile (taper, depth, etc.) control is possible
Inspection of the dimensions, uniformity and fidelity of nanoscale patterns produced with SCIVAX NIL technology
We can manage production foundry operations at our new factory equipped with a leading edge tool set.
Semiconductor devices depend on "nano-fabrication" and are the enabling technology for PCs/tablets, smartphones, automobiles and all modern electronics.
Nano-fabrication has made a huge contribution by enabling the miniaturization of electronics, and thus, the proliferation of electronic devices in everyday life.
Nano-fabrication technology also allows us to optimize light emitter brightness, minimize display/lens reflections as well as collimate, polarize or otherwise manipulate light to improve
optical device performance.
"In addition, nano-patterned surfaces are being employed as water repellant surfaces (lotus effect) and for products for biological research (e.g. nano cell culture plates) and growing number of applications in wide ranging fields and industries. "
Nanoimprint is a technology that utilizes micro or nanoscale mold patterns to be transferred onto substrates made from various materials (glass, resin, silicon, compound
It is possible to produce micro and nano patterns impossible to produce with injection molding or mechanical machining.
Comparted to patterning via photolithography, due to the simplicity of the Nanoimprint process, it is often significantly lower cost solution.
Cost advantages NIL processes lithographic processes can greatly enhance the competitiveness of electronic and optical devices fabricated.
SCIVAX's technology features not only NIL patterning of all kinds of substrates (including large glass panels, convex/concave surfaces and other challenging substrates), but also
sophisticated optical simulation, etching, inspection and other fabrication services.
In order to bring innovative designs to actual use and volume production, related processing (e.g. film deposition and etching, etc.) are also extremely important factors.
SCIVAX has built a platform for unique nano-patterning integrated solutions capability which enables cost-effective production of real devices by leveraging its full capability and knowhow.